327-2210-00L Thin Films Technology - From Fundamentals to Oxide Electronics

SemesterFall Semester 2025
LecturersC. W. Schneider and M. Trassin
Periodicityyearly course
ECTS Points5 ECTS Points can be obtained
Time

Tue 15:45-17:30; 

Thu 09:45-11:30 

Location

Tue: HIL E8; 

Thu: HPT C 130

Lecture Notesare available on Moodle
Date 2025TopicLecturer
Sept. 16General IntroductionTrassin/Schneider
Sept. 18Fundamentals IC. W. Schneider
Sept. 23Fundamentals II (Nucleation)C. W. Schneider
Sept. 25Fundamentals III (Epitaxy)C. W. Schneider
Sept. 30Growth mode & PVD - sputtering M. Trassin
Oct. 02RF sputtering; evap/MBEM. Trassin
Oct. 07PVD - PLD Schneider/Yan
Oct. 09CVDC. W. Schneider
Oct. 14Lab visitTrassin/Yan
Oct. 16Lab visitTrassin/Yan
Oct. 21Lab visitTrassin/Yan
Oct. 23Non-Vacuum techniqueSchneider/Yan
Oct. 28Non-Vac. technique (Sol Gel) / Struct. charact XRDSchneider/Trassin
Oct. 30RHEED, Ferroic IM. Trassin
Nov. 04Ferroic IIM. Trassin
Nov. 06MF type IM. Trassin
Nov. 11TF characterization IC. W. Schneider
Nov. 13Probing FE IIM. Trassin
Nov. 18MF II and probing FE IM. Trassin
Nov. 20TF characterization IIC. W. Schneider
Nov. 25TF characterization IIIC. W. Schneider
Nov. 27TF characterization IVC. W. Schneider
Dec. 02TF characterization VC. W. Schneider
Dec. 04MicrofabricationC. W. Schneider
Dec. 09Device concepts IM. Trassin
Dec. 11Device concepts IIM. Trassin
Dec. 16Q&ATrassin/Schneider
Dec. 18written exam, Loc: tbd; Time: 9:45-11:30Trassin/Schneider/Yan

 

Exam:
The written exam will be in English lasting 90 min. No accessories are allowed. 

Planned are:

 

  • Possible visit to PSI with a lab tour, including the large facilities (synchrotron-SLS)-on request