Laboratory for X-ray Nanoscience and Technologies (LXN)

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The PSI Laboratory for X-ray Nanoscience and Technologies develops and applies X-ray instrumentation at large-scale facilities using advanced micro- and nanotechology.

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Modular Assembly of Resists
•Large research facilities

Novel Photoresist Chemistry Enables Lithography Approaching Angstrom-Scale Resolution

Materials research
Nanotechnology
SLS

Photoresist materials are crucial in the manufacturing of computer chips, where the circuits are initially printed in the photoresist using photolithography.  As the demand for smaller and more precise circuitry in computer chips grows, photoresists must resolve features with smaller sizes and higher density. One of the factors determining the ultimate resolution in lithography is the molecular size/mass of the photoresists. 

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