ALM Publications

  • Ansuinelli P, Lee H, Kim W, Shin J, Ekinci Y, Mochi I
    Coherent diffractive imaging simulations for wafer inspection of periodic structures
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2025; 24(04): 041403 (11 pp.). https://doi.org/10.1117/1.JMM.24.4.041403
    DORA PSI
  • Ansuinelli P, Lee H, Kim W, Shin J, Ekinci Y, Mochi I
    Phase retrieval of periodic patterns
    In: Sendelbach MJ, Schuch NG, eds. Metrology, inspection, and process control XXXIX 2025. Vol. 13426. Proceedings of SPIE. Bellingham: SPIE; 2025:1342608 (10 pp.). https://doi.org/10.1117/12.3050578
    DORA PSI
  • Ansuinelli P, Saha S, Flores LFB, Béjar Haro B, Ekinci Y, Mochi I
    Prior–primed deep neural network based EUV mask inspection
    Optics Express. 2025; 33(6): 12572-12590. https://doi.org/10.1364/OE.550387
    DORA PSI
  • Kazazis D, Maag S, Schneider M, Ammon A, Japichino E, Vockenhuber M, et al.
    New EUV interference lithography tool at PSI: pushing the limits of resolution beyond hyper NA EUVL
    In: Burkhardt M, van Lare C, eds. Optical and EUV nanolithography XXXVIII 2025. Vol. 13424. Proceedings of SPIE. Bellingham: SPIE; 2025:134240W (6 pp.). https://doi.org/10.1117/12.3049465
    DORA PSI
  • Lee J, Ji H, Koh C, Lee J, Seok JH, Ahn J, et al.
    Ultralow line edge roughness of hybrid multilayer extreme ultraviolet resist with vertical molecular wire structure
    Materials Today. 2025; 87: 20-28. https://doi.org/10.1016/j.mattod.2025.04.007
    DORA PSI
  • Liu Z, Chen J, Yu T, Zeng Y, Guo X, Wang S, et al.
    Performance optimization of sulfonium-functionalized molecular resists for EUV and electron beam lithography
    ACS Applied Electronic Materials. 2025; 7(6): 2640-2649. https://doi.org/10.1021/acsaelm.5c00273
    DORA PSI
  • Peng R, Chen J, Yu T, Zeng Y, Wang S, Guo X, et al.
    Nonchemically-amplified molecular resists based on calixarene derivatives enabling 14 nm half-pitch nanolithography
    Chinese Journal of Chemistry. 2025; 43(13): 1513-1522. https://doi.org/10.1002/cjoc.202500041
    DORA PSI
  • Saha S, Ansuinelli P, Barba L, Mochi I, Haro BB
    Ptycho-LDM: a hybrid framework for efficient phase retrieval of EUV photomasks using conditional latent diffusion models
    Photonics. 2025; 12(9): 900 (25 pp.). https://doi.org/10.3390/photonics12090900
    DORA PSI
  • Schofield SR, J Fisher A, Ginossar E, Lyding JW, Silver R, Fei F, et al.
    Roadmap on atomic-scale semiconductor devices
    Nano Futures. 2025; 9(1): 012001 (69 pp.). https://doi.org/10.1088/2399-1984/ada901
    DORA PSI
  • Taufertshöfer N, Burri C, Venturini R, Giannopoulos I, Ekahana SA, Della Valle E, et al.
    van der Waals devices for surface-sensitive experiments
    Nanoscale. 2025; 17(34): 19957-19965. https://doi.org/10.1039/D5NR02125A
    DORA PSI
  • An H, Chen J, Zeng Y, Yu T, Wang S, Guo X, et al.
    Increasing the sensitivity of nonchemically amplified resists by oxime sulfonate-functionalized polystyrene
    ACS Applied Polymer Materials. 2024; 6(9): 5374-5384. https://doi.org/10.1021/acsapm.4c00573
    DORA PSI
  • Angelini M, Jefimovs K, Pellacani P, Kazazis D, Marabelli F, Floris F
    Angle-resolved optical characterization of a plasmonic triangular array of elliptical holes in a gold layer
    Optics. 2024; 5(1): 195-206. https://doi.org/10.3390/opt5010014
    DORA PSI
  • Ansuinelli P, Mochi I
    Tailoring the support constraint of phase retrieval algorithms improves lensless EUV nanostructures metrology
    In: Ronse KG, Naulleau PP, Gargini PA, Itani T, Franke J-H, eds. International conference on extreme ultraviolet lithography 2024. Vol. 13215. Proceedings of SPIE. Bellingham: SPIE; 2024:1321516 (7 pp.). https://doi.org/10.1117/12.3034696
    DORA PSI
  • Constantinou P, Stock TJZ, Tseng LT, Kazazis D, Muntwiler M, Vaz CAF, et al.
    EUV-induced hydrogen desorption as a step towards large-scale silicon quantum device patterning
    Nature Communications. 2024; 15(1): 694 (13 pp.). https://doi.org/10.1038/s41467-024-44790-6
    DORA PSI
  • Dang LN, Tseng LT, Rajak A, Gädda T, Laukkanen M, Salunke J, et al.
    Designing EUV negative tone resist and underlayer approaches exhibiting 14nm half-pitch resolution
    In: Guerrero D, Amblard GR, eds. Advances in patterning materials and processes. Vol. 12957. Proceedings of SPIE. Bellingham: SPIE; 2024:129570I. https://doi.org/10.1117/12.3014297
    DORA PSI
  • Dejkameh A, Nebling R, Locans U, Kim H-S, Mochi I, Ekinci Y
    Recovery of spatial frequencies in coherent diffraction imaging in the presence of a central obscuration
    Ultramicroscopy. 2024; 258: 113912 (8 pp.). https://doi.org/10.1016/j.ultramic.2023.113912
    DORA PSI
  • Evrard Q, Sadegh N, Mathew S, Zuidinga E, Watts B, Paradiz Dominguez M, et al.
    Extreme ultraviolet photoresponse of organotin-based photoresists with borate counteranions
    ACS Applied Materials and Interfaces. 2024; 16: 42947-42956. https://doi.org/10.1021/acsami.4c08636
    DORA PSI
  • Fernandez S, Rajeev R, Helfenstein P, Kazazis D, Ekinci Y, Mochi I
    Effects of temporal coherence on EUV lensless imaging
    In: Sendelbach MJ, Schuch NG, eds. Metrology, inspection, and process control XXXVIII 2024. Vol. 12955. Proceedings of SPIE. Bellingham: SPIE; 2024:129552Y (9 pp.). https://doi.org/10.1117/12.3010514
    DORA PSI
  • Gao J, Zhang S, Cui X, Cong X, Guo X, Hu R, et al.
    Optimization strategy for epoxy cross-linked molecular glass photoresist in EUV lithography
    Journal of Photochemistry and Photobiology A: Chemistry. 2024; 453: 115684 (6 pp.). https://doi.org/10.1016/j.jphotochem.2024.115684
    DORA PSI
  • Giannopoulos I, Mochi I, Vockenhuber M, Ekinci Y, Kazazis D
    Extreme ultraviolet lithography reaches 5 nm resolution
    Nanoscale. 2024; 16(33): 15533-15543. https://doi.org/10.1039/d4nr01332h
    DORA PSI
  • Kahraman A, Socie E, Nazari M, Kazazis D, Buldu-Akturk M, Kabanova V, et al.
    Tailoring p-type behavior in ZnO quantum dots through enhanced sol-gel synthesis: mechanistic insights into zinc vacancies
    Journal of Physical Chemistry Letters. 2024; 15: 1755-1764. https://doi.org/10.1021/acs.jpclett.3c03519
    DORA PSI
  • Kazazis D, Santaclara JG, van Schoot J, Mochi I, Ekinci Y
    Extreme ultraviolet lithography
    Nature Reviews Methods Primers. 2024; 4: 84 (15 pp.). https://doi.org/10.1038/s43586-024-00361-z
    DORA PSI
  • Mochi I
    Enhancing SEM image metrology with SMILE: advances, features, and portability
    In: Sendelbach MJ, Schuch NG, eds. Metrology, inspection, and process control XXXVIII. Vol. 12955. Proceedings of SPIE. Bellingham: SPIE; 2024:129553C (10 pp.). https://doi.org/10.1117/12.3010966
    DORA PSI
  • Mortelmans T, Marty B, Kazazis D, Padeste C, Li X, Ekinci Y
    Three-dimensional microfluidic capillary device for rapid and multiplexed immunoassays in whole blood
    ACS Sensors. 2024; 9(5): 2455-2464. https://doi.org/10.1021/acssensors.4c00153
    DORA PSI
  • Pellacani P, Jefimovs K, Angelini M, Marabelli F, Tolardo V, Kazazis D, et al.
    Nanofabrication process scale-up via displacement Talbot lithography of a plasmonic metasurface for sensing applications
    Optics. 2024; 5(1): 165-175. https://doi.org/10.3390/opt5010012
    DORA PSI
  • Qiao Y, Shi G, Zhang O, Li Y, Vockenhuber M, Ekinci Y, et al.
    Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography
    Science China: Materials. 2024; 67(10): 3132-3141. https://doi.org/10.1007/s40843-024-3013-9
    DORA PSI
  • Saifullah MSM, Rajak AK, Hofhuis KA, Tiwale N, Mahfoud Z, Testino A, et al.
    Approaching angstrom-scale resolution in lithography using low-molecular-mass resists (<500 Da)
    ACS Nano. 2024; 18(35): 24076-24904. https://doi.org/10.1021/acsnano.4c03939
    DORA PSI
  • Shen T, Mochi I, Ansuinelli P, Jeong D, Ahn J, Ekinci Y
    EUV reflectometry and scatterometry for thin layer and periodic structure characterization
    In: Sendelbach MJ, Schuch NG, eds. Metrology, inspection, and process control XXXVIII. Vol. 12955. Proceedings of SPIE. Bellingham: SPIE; 2024:129550D (9 pp.). https://doi.org/10.1117/12.3010875
    DORA PSI
  • Shen T, Mochi I, Jeong D, Mueller E, Ansuinelli P, Ahn J, et al.
    Spectral reflectometry characterization of an extreme ultraviolet attenuated phase-shifting mask blank
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2024; 23(4): 41402 (12 pp.). https://doi.org/10.1117/1.JMM.23.4.041402
    DORA PSI
  • Wang Z, Chen J, Yu T, Zeng Y, Guo X, Wang S, et al.
    A novel water developable tetraphenyltin-based nonchemically-amplified molecular resist for sub-13 nm lithography
    RSC Applied Interfaces. 2024; 1(3): 544-551. https://doi.org/10.1039/d3lf00254c
    DORA PSI
  • Yao X, Lian P, Chen J, Zeng Y, Yu T, Wang S, et al.
    Iodonium functionalized polystyrene as non-chemically amplified resists for electron beam and extreme ultraviolet lithography
    RSC Applied Polymers. 2024; 2(5): 870-879. https://doi.org/10.1039/d4lp00136b
    DORA PSI
  • Yuan X, Chen J, Yu T, Zeng Y, Guo X, Wang S, et al.
    Nonchemically amplified molecular resist based on multi-sulfonium modified triptycene for electron beam and extreme ultraviolet lithography
    Journal of Micro/Nanopatterning, Materials, and Metrology. 2024; 23(3): 034601 (19 pp.). https://doi.org/10.1117/1.JMM.23.3.034601
    DORA PSI