List of Publications of the LMN

Papers Published 2019

  • Nishijima Y, Balčytis A, Naganuma S, Seniutinas G, Juodkazis S
    Kirchhoff’s metasurfaces towards efficient photo-thermal energy conversion
    Scientific Reports. 2019; 9(1): 8284 (9 pp.). https://doi.org/10.1038/s41598-019-44781-4
    DORA PSI
  • Armand Pilon FT, Lyasota A, Niquet Y-M, Reboud V, Calvo V, Pauc N, et al.
    Lasing in strained germanium microbridges
    Nature Communications. 2019; 10: 2724 (8 pp.). https://doi.org/10.1038/s41467-019-10655-6
    DORA PSI
  • Fallica R
    Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect
    Advanced Optical Technologies. 2019; 8(3-4): 233-240. https://doi.org/10.1515/aot-2019-0005
    DORA PSI
  • Kirchner R, Guzenko VA, Schift H
    Single-digit 6-nm multilevel patterns by electron beam grayscale lithography
    Advanced Optical Technologies. 2019; 8(3-4): 175-180. https://doi.org/10.1515/aot-2019-0016
    DORA PSI
  • Seaberg M, Cojocaru R, Berujon S, Ziegler E, Jaggi A, Krempasky J, et al.
    Wavefront sensing at X-ray free-electron lasers
    Journal of Synchrotron Radiation. 2019; 26: 1115-1126. https://doi.org/10.1107/S1600577519005721
    DORA PSI
  • Gliga S, Seniutinas G, Weber A, David C
    Architectural structures open new dimensions in magnetism: Magnetic buckyballs
    Materials Today. 2019; 26: 100-101. https://doi.org/10.1016/j.mattod.2019.05.001
    DORA PSI
  • Förster J, Gräfe J, Bailey J, Finizio S, Träger N, Groß F, et al.
    Direct observation of coherent magnons with suboptical wavelengths in a single-crystalline ferrimagnetic insulator
    Physical Review B. 2019; 100(21): 214416 (7 pp.). https://doi.org/10.1103/PhysRevB.100.214416
    DORA PSI
  • Förster J, Wintz S, Bailey J, Finizio S, Josten E, Dubs C, et al.
    Nanoscale X-ray imaging of spin dynamics in yttrium iron garnet
    Journal of Applied Physics. 2019; 126(17): 173909 (11 pp.). https://doi.org/10.1063/1.5121013
    DORA PSI
  • Förster S, Schenk S, Zollner EM, Krahn O, Chiang C-T, Schumann FO, et al.
    Quasicrystals and their approximants in 2D ternary oxides
    Physica Status Solidi B: Basic Research. 2019: 1900624 (11 pp.). https://doi.org/10.1002/pssb.201900624
    DORA PSI
  • Horváth B, Schäublin R, Dai Y
    Flash electropolishing of TEM lamellas of irradiated tungsten
    Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms. 2019; 449: 29-34. https://doi.org/10.1016/j.nimb.2019.04.047
    DORA PSI
  • Saha S, Zelent M, Finizio S, Mruczkiewicz M, Tacchi S, Suszka AK, et al.
    Formation of Néel-type skyrmions in an antidot lattice with perpendicular magnetic anisotropy
    Physical Review B. 2019; 100(14): 144435 (9 pp.). https://doi.org/10.1103/PhysRevB.100.144435
    DORA PSI
  • Wang X, Tseng L-T, Mochi I, Vockenhuber M, van Lent-Protasova L, Custers R, et al.
    Progress in EUV resists for contact holes printing using EUV interference lithography
    In: Behringer UFW, Finders J, eds. 35th European mask and lithography conference (EMLC 2019). Vol. 1177. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2535678
    DORA PSI
  • Ye L, Rouxel JR, Asban S, Rösner B, Mukamel S
    Probing molecular chirality by orbital-angular-momentum-carrying X-ray pulses
    Journal of Chemical Theory and Computation. 2019; 15(7): 4180-4186. https://doi.org/10.1021/acs.jctc.9b00346
    DORA PSI
  • Nebling R, Mochi I, Kazazis D, Locans U, Dejkameh A, Ekinci Y
    EUV reticle inspection using phase retrieval algorithms: a performance comparison
    In: Itani T, Gargini PA, Naulleau PP, Ronse KG, eds. International conference on extreme ultraviolet lithography 2019. Vol. 11147. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2536936
    DORA PSI
  • Frey M, Adelmann A, Locans U
    On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code
    Computer Physics Communications. 2019: 106912 (18 pp.). https://doi.org/10.1016/j.cpc.2019.106912
    DORA PSI
  • Holler M, Odstrcil M, Guizar-Sicairos M, Lebugle M, Müller E, Finizio S, et al.
    Three-dimensional imaging of integrated circuits with macro- to nanoscale zoom
    Nature Electronics. 2019; 2: 464-470. https://doi.org/10.1038/s41928-019-0309-z
    DORA PSI
  • Mochi I, Locans U, Dejkameh A, Nebling R, Kazazis D, Tseng L-T, et al.
    Resolution enhancement for lensless mask metrology with RESCAN
    In: Itani T, Gargini PA, Naulleau PP, Ronse KG, eds. International conference on extreme ultraviolet lithography 2019. Vol. 11147. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2537068
    DORA PSI
  • Wang X, Tasdemir Z, Mochi I, Vockenhuber M, van Lent-Protasova L, Meeuwissen M, et al.
    Progress in EUV resists towards high-NA EUV lithography
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2516260
    DORA PSI
  • O’Callaghan G, Popescu C, McClelland A, Kazazis D, Roth J, Theis W, et al.
    Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography
    In: Gronheid R, Sanders DP, eds. Advances in patterning materials and processes XXXVI. Vol. 10960. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515084
    DORA PSI
  • Gädda T, Luong ND, Laukkanen M, Karaste K, Kähkönen O, Kauppi E, et al.
    Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
    In: Gronheid R, Sanders DP, eds. Advances in patterning materials and processes XXXVI. Vol. 10960. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515600
    DORA PSI
  • Thakur N, Vockenhuber M, Ekinci Y, Castellanos S
    Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
    In: Kenneth A. G, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2514814
    DORA PSI
  • Wu L, Vockenhuber M, Ekinci Y, Castellanos S
    The role of the organic shell in hybrid molecular materials for EUV lithography
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515264
    DORA PSI
  • Woerle J, Prokscha T, Hallén A, Grossner U
    Interaction of low-energy muons with defect profiles in proton-irradiated Si and 4H-SiC
    Physical Review B. 2019; 100(11): 115202 (7 pp.). https://doi.org/10.1103/PhysRevB.100.115202
    DORA PSI
  • Hemmi A, Cun H, Tocci G, Epprecht A, Stel B, Lingenfelder M, et al.
    Catalyst proximity-induced functionalization of h-BN with quat derivatives
    Nano Letters. 2019; 19(9): 5998-6004. https://doi.org/10.1021/acs.nanolett.9b01792
    DORA PSI
  • Usachov DY, Tarasov AV, Matsui F, Muntwiler M, Bokai KA, Shevelev VO, et al.
    Decoding the structure of interfaces and impurities in 2D materials by photoelectron holography
    2D Materials. 2019; 6(4): 045046 (13 pp.). https://doi.org/10.1088/2053-1583/ab3ea8
    DORA PSI
  • Dutta D, De DS, Fan D, Roy S, Alfieri G, Camarda M, et al.
    Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
    Applied Physics Letters. 2019; 115(10): 101601 (5 pp.). https://doi.org/10.1063/1.5112779
    DORA PSI
  • Woerle J, Johnson BC, Bongiorno C, Yamasue K, Ferro G, Dutta D, et al.
    Two-dimensional defect mapping of the SiO2/4H−SiC interface
    Physical Review Materials. 2019; 3(8): 084602 (8 pp.). https://doi.org/10.1103/PhysRevMaterials.3.084602
    DORA PSI
  • Mochi I, Kazazis D, Tseng L-T, Fernandez S, Rajeev R, Locans U, et al.
    Lensless metrology for semiconductor lithography at EUV
    In: Bodermann B, Frenner K, Silver RM, eds. Modeling aspects in optical metrology VII. Vol. 11057. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2534350
    DORA PSI
  • Wang X, Tseng L-T, Kazazis D, Tasdemir Z, Vockenhuber M, Mochi I, et al.
    Studying resist performance for contact holes printing using EUV interference lithography
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
    DORA PSI
  • Kang BJ, Gäumann G, Numan N, Ollmann Z, Waeber Y, Bagiante S, et al.
    THz-induced insulator-to-metal transition in stacked VO2 nano-slits
    In: Proceedings of the 44th international conference on infrared, millimeter and terahertz waves (IRMMW-THz). Danvers, MA: IEEE; 2019. https://doi.org/10.1109/IRMMW-THz.2019.8873912
    DORA PSI
  • Winter A, Ekinci Y, Gölzhäuser A, Turchanin A
    Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography
    2D Materials. 2019; 6(2): 021002 (8 pp.). https://doi.org/10.1088/2053-1583/ab0014
    DORA PSI
  • Fernandez S, Kazazis D, Rajendran R, Mochi I, Helfenstein P, Yoshitake S, et al.
    Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
    DORA PSI
  • Mochi I, Ekinci Y
    Lensless EUV lithography and imaging
    Synchrotron Radiation News. 2019; 32(4): 22-27. https://doi.org/10.1080/08940886.2019.1634433
    DORA PSI
  • Tseng L-T, Kazazis D, Wang X, Popescu CM, Robinson APG, Ekinci Y
    Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks
    Microelectronic Engineering. 2019; 210: 8-13. https://doi.org/10.1016/j.mee.2019.03.002
    DORA PSI
  • Preger C, Bulbucan C, Meuller BO, Ludvigsson L, Kostanyan A, Muntwiler M, et al.
    Controlled oxidation and self-passivation of bimetallic magnetic FeCr and FeMn aerosol nanoparticles
    Journal of Physical Chemistry C. 2019; 123(26): 16083-16090. https://doi.org/10.1021/acs.jpcc.9b01678
    DORA PSI
  • Strocov VN, Lev LL, Kobayashi M, Cancellieri C, Husanu M-A, Chikina A, et al.
    k-resolved electronic structure of buried heterostructure and impurity systems by soft-X-ray ARPES
    Journal of Electron Spectroscopy and Related Phenomena. 2019; 236: 1-8. https://doi.org/10.1016/j.elspec.2019.06.009
    DORA PSI
  • Tsujino S, Sato Y, Takeda Y, Tomizaki T
    Oscillation resonances and anisotropic damping of the motion of acoustically levitated droplets in single-axis acoustic levitators
    Applied Physics Letters. 2019; 115: 053702 (5 pp.). https://doi.org/10.1063/1.5112109
    DORA PSI
  • Haydous F, Si W, Guzenko VA, Waag F, Pomjakushina E, El Kazzi M, et al.
    Improved photoelectrochemical water splitting of CaNbO2N photoanodes by CoPi photodeposition and durface passivation
    Journal of Physical Chemistry C. 2019; 123(2): 1059-1068. https://doi.org/10.1021/acs.jpcc.8b09629
    DORA PSI
  • Mochi I, Fernandez S, Nebling R, Locans U, Helfenstein P, Rajeev R, et al.
    Absorber and phase defect inspection on EUV reticles using RESCAN
    In: Goldberg KA, ed. Extreme Ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2515160
    DORA PSI
  • Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, Jung T, et al.
    Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013504 (10 pp.). https://doi.org/10.1117/1.JMM.18.1.013504
    DORA PSI
  • Marks K, Yazdi MG, Piskorz W, Simonov K, Stefanuik R, Sostina D, et al.
    Investigation of the surface species during temperature dependent dehydrogenation of naphthalene on Ni(111)
    Journal of Chemical Physics. 2019; 150: 244704 (8 pp.). https://doi.org/10.1063/1.5098533
    DORA PSI
  • Sendetskyi O, Scagnoli V, Leo N, Anghinolfi L, Alberca A, Lüning J, et al.
    Continuous magnetic phase transition in artificial square ice
    Physical Review B. 2019; 99(21): 214430 (11 pp.). https://doi.org/10.1103/PhysRevB.99.214430
    DORA PSI
  • Grillo F, Megginson R, Batchelor D, Muntwiler M, Baddeley CJ
    Structural and electronic characterization of Cu/Au(111) near-surface alloys
    Japanese Journal of Applied Physics. 2019; 58(SI): SIIB09 (5 pp.). https://doi.org/10.7567/1347-4065/ab1b5b
    DORA PSI
  • Odstrčil M, Lebugle M, Guizar-Sicairos M, David C, Holler M
    Towards optimized illumination for high-resolution ptychography
    Optics Express. 2019; 27(10): 14981 (17 pp.). https://doi.org/10.1364/OE.27.014981
    DORA PSI
  • Döring F, Risch M, Rösner B, Beye M, Busse P, Kubiček K, et al.
    A zone-plate-based two-color spectrometer for indirect X-ray absorption spectroscopy
    Journal of Synchrotron Radiation. 2019; 26: 1266-1271. https://doi.org/10.1107/S1600577519003898
    DORA PSI
  • Mochi I, Timmermans MY, Gallagher EE, Mariano M, Pollentier I, Rajendran R, et al.
    Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
    DORA PSI
  • Tsujino S, Shinoda A, Tomizaki T
    On-demand droplet loading of ultrasonic acoustic levitator and its application for protein crystallography experiments
    Applied Physics Letters. 2019; 114(21): 213702 (5 pp.). https://doi.org/10.1063/1.5095574
    DORA PSI
  • Tomizaki T, Shinoda A, Tsujino S
    Single crystal time-lapse measurement using ultrasonic acoustic levitation
    In: Gwo S, Huang D-J, Wei D-H, eds. Proceedings of the 13th international conference on synchrotron radiation instrumentation – SRI2018. Vol. 2054. AIP conference proceedings. Melville, New York: AIP Publishing; 2019. https://doi.org/10.1063/1.5084703
    DORA PSI
  • Brenner G, Dziarzhytski S, Miedema PS, Rösner B, David C, Beye M
    Normalized single-shot X-ray absorption spectroscopy at a free-electron laser
    Optics Letters. 2019; 44(9): 2157-2160. https://doi.org/10.1364/OL.44.002157
    DORA PSI
  • Jal E, Makita M, Rösner B, David C, Nolting F, Raabe J, et al.
    Single-shot time-resolved magnetic x-ray absorption at a free-electron laser
    Physical Review B. 2019; 99(14): 144305 (9 pp.). https://doi.org/10.1103/PhysRevB.99.144305
    DORA PSI
  • Górzny MŁ, Opara NL, Guzenko VA, Cadarso VJ, Schift H, Li XD, et al.
    Microfabricated silicon chip as lipid membrane sample holder for serial protein crystallography
    Micro and Nano Engineering. 2019; 3: 31-36. https://doi.org/10.1016/j.mne.2019.03.002
    DORA PSI
  • Odstrcil M, Lebugle M, Lachat T, Raabe J, Holler M
    Fast positioning for X-ray scanning microscopy by a combined motion of sample and beam-defining optics
    Journal of Synchrotron Radiation. 2019; 26(2): 504-509. https://doi.org/10.1107/S160057751801785X
    DORA PSI
  • Ahsan A, Mousavi SF, Nijs T, Nowakowska S, Popova O, Wäckerlin A, et al.
    Phase transitions in confinements: controlling solid to fluid transitions of xenon atoms in an on-surface network
    Small. 2019; 15(3): 1803169 (7 pp.). https://doi.org/10.1002/smll.201803169
    DORA PSI
  • Kirchner R, Schift H
    Thermal reflow of polymers for innovative and smart 3D structures: A review
    Materials Science in Semiconductor Processing. 2019; 92: 58-72. https://doi.org/10.1016/j.mssp.2018.07.032
    DORA PSI
  • Horváth B, Křivová B, Bolat S, Schift H
    Fabrication of large area sub-200 nm conducting electrode arrays by self-confinement of spincoated metal nanoparticle inks
    Advanced Materials Technologies. 2019; 4(3): 1800652 (11 pp.). https://doi.org/10.1002/admt.201800652
    DORA PSI
  • Greber T, Seitsonen AP, Hemmi A, Dreiser J, Stania R, Matsui F, et al.
    Circular dichroism and angular deviation in x-ray absorption spectra of Dy2ScN@C80 single-molecule magnets on h-BN/Rh(111)
    Physical Review Materials. 2019; 3(1): 014409 (5 pp.). https://doi.org/10.1103/PhysRevMaterials.3.014409
    DORA PSI
  • Svetina C, Mankowsky R, Knopp G, Koch F, Seniutinas G, Rösner B, et al.
    Towards X-ray transient grating spectroscopy
    Optics Letters. 2019; 44(3): 574-577. https://doi.org/10.1364/OL.44.000574
    DORA PSI
  • Moradi M, Opara NL, Tulli LG, Wäckerlin C, Dalgarno SJ, Teat SJ, et al.
    Supramolecular architectures of molecularly thin yet robust free-standing layers
    Science Advances. 2019; 5(2): eaav4489 (7 pp.). https://doi.org/10.1126/sciadv.aav4489
    DORA PSI
  • Rösner B, Dudin P, Bosgra J, Hoesch M, David C
    Zone plates for angle-resolved photoelectron spectroscopy providing sub-micrometre resolution in the extreme ultraviolet regime
    Journal of Synchrotron Radiation. 2019; 26(2): 467-472. https://doi.org/10.1107/S1600577519000869
    DORA PSI
  • Nida S, Tsibizov A, Ziemann T, Woerle J, Moesch A, Schulze-Briese C, et al.
    Silicon carbide X-ray beam position monitors for synchrotron applications
    Journal of Synchrotron Radiation. 2019; 26(1): 28-35. https://doi.org/10.1107/S1600577518014248
    DORA PSI
  • Crha J, Vila-Comamala J, Lehmann E, David C, Trtik P
    Light yield enhancement of 157-gadolinium oxysulfide scintillator screens for the high-resolution neutron imaging
    MethodsX. 2019; 6: 107-114. https://doi.org/10.1016/j.mex.2018.12.005
    DORA PSI
  • Makita M, Vartiainen I, Mohacsi I, Caleman C, Diaz A, Jönsson HO, et al.
    Femtosecond phase-transition in hard x-ray excited bismuth
    Scientific Reports. 2019; 9(1): 602 (7 pp.). https://doi.org/10.1038/s41598-018-36216-3
    DORA PSI
  • Heldt G, Thompson P, Chopdekar RV, Kohlbrecher J, Lee S, Heyderman LJ, et al.
    Characterisation of size distribution and positional misalignment of nanoscale islands by small-angle X-ray scattering
    Journal of Applied Physics. 2019; 125(1): 014301 (8 pp.). https://doi.org/10.1063/1.5050882
    DORA PSI
  • Gottlieb S, Rösner B, Evangelio L, Fernández-Regúlez M, Nogales A, García-Gutiérrez MC, et al.
    Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
    Molecular Systems Design & Engineering. 2019; 4(1): 175-185. https://doi.org/10.1039/c8me00046h
    DORA PSI
  • Krempaský J, Fanciulli M, Pilet N, Minár J, Khan W, Muntwiler M, et al.
    Spin-resolved electronic structure of ferroelectric α-GeTe and multiferroic Ge1–xMnxTe
    Journal of Physics and Chemistry of Solids. 2019; 128: 237-244. https://doi.org/10.1016/j.jpcs.2017.11.010
    DORA PSI
  • Kagias M, Wang Z, Guzenko VA, David C, Stampanoni M, Jefimovs K
    Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry
    Materials Science in Semiconductor Processing. 2019; 92: 73-79. https://doi.org/10.1016/j.mssp.2018.04.015
    DORA PSI
  • Ekinci Y, Garvey T, Rivkin L, Streun A, Wrulich A
    A compact high-brightness accelerator-based EUV source for actinic mask inspection
    In: Optics InfoBase Conference Papers. Vol. Part F85-EUVXRAY 2018. OSA - The Optical Society; 2018. https://doi.org/10.1364/EUVXRAY.2018.ET3B.5
    DORA PSI
  • Fernandez S, Kazazis D, Rajeev R, Mochi I, Helfenstein P, Yoshitake S, et al.
    A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297381
    DORA PSI
  • Mochi I, Rajeev R, Helfenstein P, Fernandez S, Kazazis D, Ekinci Y
    Through-pellicle inspection of EUV masks
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297436
    DORA PSI
  • Castellanos S, Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, et al.
    Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297167
    DORA PSI
  • Manouras T, Kazazis D, Koufakis E, Ekinci Y, Vamvakaki M, Argitis P
    Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking
    In: Goldberg KA, ed. SPIE advanced lithography. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2299853
    DORA PSI
  • Wang X, Tseng L-T, Kazazis D, Tasdemir Z, Vockenhuber M, Mochi I, et al.
    Studying resist performance for contact holes printing using EUV interference lithography
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2501949
    DORA PSI
  • Rajeev R, Mochi I, Kazazis D, Fernandez S, Li-Teng T, Helfenstein P, et al.
    Phase defect inspection on EUV masks using RESCAN
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2502726
    DORA PSI
  • Tasdemir Z, Vockenhuber M, Mochi I, Garrido Olvera K, Meeuwissen M, Yildirim O, et al.
    Chemically-amplified EUV resists approaching 11nm half-pitch
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2299643
    DORA PSI
  • Krempaský J, Koch F, Vagovič P, Mikeš L, Jaggi A, Svetina C, et al.
    Inspecting adaptive optics with at-wavelength wavefront metrology
    In: Spiga D, Mimura H, eds. Adaptive X-ray optics V. Vol. 10761. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2320532
    DORA PSI
  • Rantala J, Gädda T, Laukkanen M, Nguyen Dang L, Karaste K, Kazazis D, et al.
    New resist and underlayer approaches toward EUV lithography
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2503107
    DORA PSI
  • Dejkameh A, Erdmann A, Evanschitzky P, Ekinci Y
    Fourier ptychography for lithography high NA systems
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    DORA PSI
  • Muntwiler M, Zhang J, Stania R, Matsui F, Oberta P, Flechsig U, et al.
    Surface science at the PEARL beamline of the Swiss Light Source
    Journal of Synchrotron Radiation. 2017; 24(1): 354-366. https://doi.org/10.1107/S1600577516018646
    DORA PSI
  • Mojarad N, Pfohl T, Ekinci Y
    Soft electrostatic trapping in nanofluidics
    Microsystems and Nanoengineering. 2017; 3. https://doi.org/10.1038/micronano.2017.51
    DORA PSI
  • Haitjema J, Zhang Y, Vockenhuber M, Kazazis D, Ekinci Y, Brouwer AM
    Extreme ultraviolet patterning of tin-oxo cages
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2017; 16(3): 033510 (7 pp.). https://doi.org/10.1117/1.JMM.16.3.033510
    DORA PSI
  • Helfenstein P, Mochi I, Rajeev R, Fernandez S, Ekinci Y
    Coherent diffractive imaging methods for semiconductor manufacturing
    Advanced Optical Technologies. 2017; 6(6): 439-448. https://doi.org/10.1515/aot-2017-0052
    DORA PSI
  • Fan D, Sigg H, Spolenak R, Ekinci Y
    Strain and thermal conductivity in ultrathin suspended silicon nanowires
    Physical Review B. 2017; 96(11): 115307. https://doi.org/10.1103/PhysRevB.96.115307
    DORA PSI
  • Mochi I, Helfenstein P, Mohacsi I, Rajeev R, Kazazis D, Yoshitake S, et al.
    RESCAN: An actinic lensless microscope for defect inspection of EUV reticles
    2017. https://doi.org/10.1117/1.JMM.16.4.041003
    DORA PSI
  • Gerspach MA, Mojarad N, Sharma D, Pfohl T, Ekinci Y
    Nanofluidic lab-on-a-chip trapping devices for screening electrostatics in concentration gradients
    Microelectronic Engineering. 2017; 175: 17-22. https://doi.org/10.1016/j.mee.2016.12.017
    DORA PSI
  • Sharma D, Gerspach MA, Pfohl T, Lim RYH, Ekinci Y
    Single positively charged particle trapping in nanofluidic systems
    Microelectronic Engineering. 2017; 175: 43-49. https://doi.org/10.1016/j.mee.2017.01.001
    DORA PSI
Papers published from 2011 to 2016
List of Publications 2007 - 2011 (PDF)

Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Head a.i.
Dr. Yasin Ekinci

Secretary
Ms. Anne Sacher

Tel +41 56 310 2814
Fax +41 56 310 2646
Email: annekathrin.sacher@psi.ch

Photon Science Division

Homepage of PSI Division Photon Science (PSD)