List of Publications of the LMN

  • Wang X, Tseng L-T, Mochi I, Vockenhuber M, van Lent-Protasova L, Custers R, et al.
    Progress in EUV resists for contact holes printing using EUV interference lithography
    In: Behringer UFW, Finders J, eds. 35th European mask and lithography conference (EMLC 2019). Vol. 1177. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2535678
    DORA PSI
  • Ye L, Rouxel JR, Asban S, Rösner B, Mukamel S
    Probing molecular chirality by orbital-angular-momentum-carrying X-ray pulses
    Journal of Chemical Theory and Computation. 2019; 15(7): 4180-4186. https://doi.org/10.1021/acs.jctc.9b00346
    DORA PSI
  • Nebling R, Mochi I, Kazazis D, Locans U, Dejkameh A, Ekinci Y
    EUV reticle inspection using phase retrieval algorithms: a performance comparison
    In: Itani T, Gargini PA, Naulleau PP, Ronse KG, eds. International conference on extreme ultraviolet lithography 2019. Vol. 11147. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2536936
    DORA PSI
  • Frey M, Adelmann A, Locans U
    On architecture and performance of adaptive mesh refinement in an electrostatics Particle-In-Cell code
    Computer Physics Communications. 2019: 106912 (18 pp.). https://doi.org/10.1016/j.cpc.2019.106912
    DORA PSI
  • Holler M, Odstrcil M, Guizar-Sicairos M, Lebugle M, Müller E, Finizio S, et al.
    Three-dimensional imaging of integrated circuits with macro- to nanoscale zoom
    Nature Electronics. 2019; 2: 464-470. https://doi.org/10.1038/s41928-019-0309-z
    DORA PSI
  • Mochi I, Locans U, Dejkameh A, Nebling R, Kazazis D, Tseng L-T, et al.
    Resolution enhancement for lensless mask metrology with RESCAN
    In: Itani T, Gargini PA, Naulleau PP, Ronse KG, eds. International conference on extreme ultraviolet lithography 2019. Vol. 11147. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2537068
    DORA PSI
  • Wang X, Tasdemir Z, Mochi I, Vockenhuber M, van Lent-Protasova L, Meeuwissen M, et al.
    Progress in EUV resists towards high-NA EUV lithography
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2516260
    DORA PSI
  • O’Callaghan G, Popescu C, McClelland A, Kazazis D, Roth J, Theis W, et al.
    Multi-trigger resist: novel synthesis improvements for high resolution EUV lithography
    In: Gronheid R, Sanders DP, eds. Advances in patterning materials and processes XXXVI. Vol. 10960. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515084
    DORA PSI
  • Gädda T, Luong ND, Laukkanen M, Karaste K, Kähkönen O, Kauppi E, et al.
    Advanced EUV negative tone resist and underlayer approaches exhibiting sub-20nm half-pitch resolution
    In: Gronheid R, Sanders DP, eds. Advances in patterning materials and processes XXXVI. Vol. 10960. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515600
    DORA PSI
  • Thakur N, Vockenhuber M, Ekinci Y, Castellanos S
    Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
    In: Kenneth A. G, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2514814
    DORA PSI
  • Wu L, Vockenhuber M, Ekinci Y, Castellanos S
    The role of the organic shell in hybrid molecular materials for EUV lithography
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, USA: SPIE; 2019. https://doi.org/10.1117/12.2515264
    DORA PSI
  • Woerle J, Prokscha T, Hallén A, Grossner U
    Interaction of low-energy muons with defect profiles in proton-irradiated Si and 4H-SiC
    Physical Review B. 2019; 100(11): 115202 (7 pp.). https://doi.org/10.1103/PhysRevB.100.115202
    DORA PSI
  • Hemmi A, Cun H, Tocci G, Epprecht A, Stel B, Lingenfelder M, et al.
    Catalyst proximity-induced functionalization of h-BN with quat derivatives
    Nano Letters. 2019; 19(9): 5998-6004. https://doi.org/10.1021/acs.nanolett.9b01792
    DORA PSI
  • Usachov DY, Tarasov AV, Matsui F, Muntwiler M, Bokai KA, Shevelev VO, et al.
    Decoding the structure of interfaces and impurities in 2D materials by photoelectron holography
    2D Materials. 2019; 6(4): 045046 (13 pp.). https://doi.org/10.1088/2053-1583/ab3ea8
    DORA PSI
  • Dutta D, De DS, Fan D, Roy S, Alfieri G, Camarda M, et al.
    Evidence for carbon clusters present near thermal gate oxides affecting the electronic band structure in SiC-MOSFET
    Applied Physics Letters. 2019; 115(10): 101601 (5 pp.). https://doi.org/10.1063/1.5112779
    DORA PSI
  • Woerle J, Johnson BC, Bongiorno C, Yamasue K, Ferro G, Dutta D, et al.
    Two-dimensional defect mapping of the SiO2/4H−SiC interface
    Physical Review Materials. 2019; 3(8): 084602 (8 pp.). https://doi.org/10.1103/PhysRevMaterials.3.084602
    DORA PSI
  • Mochi I, Kazazis D, Tseng L-T, Fernandez S, Rajeev R, Locans U, et al.
    Lensless metrology for semiconductor lithography at EUV
    In: Bodermann B, Frenner K, Silver RM, eds. Modeling aspects in optical metrology VII. Vol. 11057. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2534350
    DORA PSI
  • Wang X, Tseng L-T, Kazazis D, Tasdemir Z, Vockenhuber M, Mochi I, et al.
    Studying resist performance for contact holes printing using EUV interference lithography
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013501 (11 pp.). https://doi.org/10.1117/1.JMM.18.1.013501
    DORA PSI
  • Kang BJ, Gäumann G, Numan N, Ollmann Z, Waeber Y, Bagiante S, et al.
    THz-induced insulator-to-metal transition in stacked VO2 nano-slits
    In: Proceedings of the 44th international conference on infrared, millimeter and terahertz waves (IRMMW-THz). Danvers, MA: IEEE; 2019. https://doi.org/10.1109/IRMMW-THz.2019.8873912
    DORA PSI
  • Winter A, Ekinci Y, Gölzhäuser A, Turchanin A
    Freestanding carbon nanomembranes and graphene monolayers nanopatterned via EUV interference lithography
    2D Materials. 2019; 6(2): 021002 (8 pp.). https://doi.org/10.1088/2053-1583/ab0014
    DORA PSI
  • Fernandez S, Kazazis D, Rajendran R, Mochi I, Helfenstein P, Yoshitake S, et al.
    Comparative study of extreme ultraviolet absorber materials using lensless actinic imaging
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013506 (6 pp.). https://doi.org/10.1117/1.JMM.18.1.013506
    DORA PSI
  • Mochi I, Ekinci Y
    Lensless EUV lithography and imaging
    Synchrotron Radiation News. 2019; 32(4): 22-27. https://doi.org/10.1080/08940886.2019.1634433
    DORA PSI
  • Tseng L-T, Kazazis D, Wang X, Popescu CM, Robinson APG, Ekinci Y
    Sub-20 nm Si fins with high aspect ratio via pattern transfer using fullerene-based spin-on-carbon hard masks
    Microelectronic Engineering. 2019; 210: 8-13. https://doi.org/10.1016/j.mee.2019.03.002
    DORA PSI
  • Preger C, Bulbucan C, Meuller BO, Ludvigsson L, Kostanyan A, Muntwiler M, et al.
    Controlled oxidation and self-passivation of bimetallic magnetic FeCr and FeMn aerosol nanoparticles
    Journal of Physical Chemistry C. 2019; 123(26): 16083-16090. https://doi.org/10.1021/acs.jpcc.9b01678
    DORA PSI
  • Strocov VN, Lev LL, Kobayashi M, Cancellieri C, Husanu M-A, Chikina A, et al.
    k-resolved electronic structure of buried heterostructure and impurity systems by soft-X-ray ARPES
    Journal of Electron Spectroscopy and Related Phenomena. 2019; 236: 1-8. https://doi.org/10.1016/j.elspec.2019.06.009
    DORA PSI
  • Tsujino S, Sato Y, Takeda Y, Tomizaki T
    Oscillation resonances and anisotropic damping of the motion of acoustically levitated droplets in single-axis acoustic levitators
    Applied Physics Letters. 2019; 115: 053702 (5 pp.). https://doi.org/10.1063/1.5112109
    DORA PSI
  • Haydous F, Si W, Guzenko VA, Waag F, Pomjakushina E, El Kazzi M, et al.
    Improved photoelectrochemical water splitting of CaNbO2N photoanodes by CoPi photodeposition and durface passivation
    Journal of Physical Chemistry C. 2019; 123(2): 1059-1068. https://doi.org/10.1021/acs.jpcc.8b09629
    DORA PSI
  • Mochi I, Fernandez S, Nebling R, Locans U, Helfenstein P, Rajeev R, et al.
    Absorber and phase defect inspection on EUV reticles using RESCAN
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography X. Vol. 10957. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2019. https://doi.org/10.1117/12.2515160
    DORA PSI
  • Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, Jung T, et al.
    Mechanistic insights in Zr- and Hf-based molecular hybrid EUV photoresists
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 013504 (10 pp.). https://doi.org/10.1117/1.JMM.18.1.013504
    DORA PSI
  • Marks K, Yazdi MG, Piskorz W, Simonov K, Stefanuik R, Sostina D, et al.
    Investigation of the surface species during temperature dependent dehydrogenation of naphthalene on Ni(111)
    Journal of Chemical Physics. 2019; 150: 244704 (8 pp.). https://doi.org/10.1063/1.5098533
    DORA PSI
  • Sendetskyi O, Scagnoli V, Leo N, Anghinolfi L, Alberca A, Lüning J, et al.
    Continuous magnetic phase transition in artificial square ice
    Physical Review B. 2019; 99(21): 214430 (11 pp.). https://doi.org/10.1103/PhysRevB.99.214430
    DORA PSI
  • Grillo F, Megginson R, Batchelor D, Muntwiler M, Baddeley CJ
    Structural and electronic characterization of Cu/Au(111) near-surface alloys
    Japanese Journal of Applied Physics. 2019; 58(SI): SIIB09 (5 pp.). https://doi.org/10.7567/1347-4065/ab1b5b
    DORA PSI
  • Odstrčil M, Lebugle M, Guizar-Sicairos M, David C, Holler M
    Towards optimized illumination for high-resolution ptychography
    Optics Express. 2019; 27(10): 14981 (17 pp.). https://doi.org/10.1364/OE.27.014981
    DORA PSI
  • Döring F, Risch M, Rösner B, Beye M, Busse P, Kubiček K, et al.
    A zone-plate-based two-color spectrometer for indirect X-ray absorption spectroscopy
    Journal of Synchrotron Radiation. 2019; 26: 1266-1271. https://doi.org/10.1107/S1600577519003898
    DORA PSI
  • Mochi I, Timmermans MY, Gallagher EE, Mariano M, Pollentier I, Rajendran R, et al.
    Experimental evaluation of the impact of carbon nanotube EUV pellicles on reticle imaging
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2019; 18(1): 014002 (7 pp.). https://doi.org/10.1117/1.JMM.18.1.014002
    DORA PSI
  • Tsujino S, Shinoda A, Tomizaki T
    On-demand droplet loading of ultrasonic acoustic levitator and its application for protein crystallography experiments
    Applied Physics Letters. 2019; 114(21): 213702 (5 pp.). https://doi.org/10.1063/1.5095574
    DORA PSI
  • Tomizaki T, Shinoda A, Tsujino S
    Single crystal time-lapse measurement using ultrasonic acoustic levitation
    In: Gwo S, Huang D-J, Wei D-H, eds. Proceedings of the 13th international conference on synchrotron radiation instrumentation – SRI2018. Vol. 2054. AIP conference proceedings. Melville, New York: AIP Publishing; 2019. https://doi.org/10.1063/1.5084703
    DORA PSI
  • Brenner G, Dziarzhytski S, Miedema PS, Rösner B, David C, Beye M
    Normalized single-shot X-ray absorption spectroscopy at a free-electron laser
    Optics Letters. 2019; 44(9): 2157-2160. https://doi.org/10.1364/OL.44.002157
    DORA PSI
  • Jal E, Makita M, Rösner B, David C, Nolting F, Raabe J, et al.
    Single-shot time-resolved magnetic x-ray absorption at a free-electron laser
    Physical Review B. 2019; 99(14): 144305 (9 pp.). https://doi.org/10.1103/PhysRevB.99.144305
    DORA PSI
  • Górzny MŁ, Opara NL, Guzenko VA, Cadarso VJ, Schift H, Li XD, et al.
    Microfabricated silicon chip as lipid membrane sample holder for serial protein crystallography
    Micro and Nano Engineering. 2019; 3: 31-36. https://doi.org/10.1016/j.mne.2019.03.002
    DORA PSI
  • Odstrcil M, Lebugle M, Lachat T, Raabe J, Holler M
    Fast positioning for X-ray scanning microscopy by a combined motion of sample and beam-defining optics
    Journal of Synchrotron Radiation. 2019; 26(2): 504-509. https://doi.org/10.1107/S160057751801785X
    DORA PSI
  • Ahsan A, Mousavi SF, Nijs T, Nowakowska S, Popova O, Wäckerlin A, et al.
    Phase transitions in confinements: controlling solid to fluid transitions of xenon atoms in an on-surface network
    Small. 2019; 15(3): 1803169 (7 pp.). https://doi.org/10.1002/smll.201803169
    DORA PSI
  • Kirchner R, Schift H
    Thermal reflow of polymers for innovative and smart 3D structures: A review
    Materials Science in Semiconductor Processing. 2019; 92: 58-72. https://doi.org/10.1016/j.mssp.2018.07.032
    DORA PSI
  • Horváth B, Křivová B, Bolat S, Schift H
    Fabrication of large area sub-200 nm conducting electrode arrays by self-confinement of spincoated metal nanoparticle inks
    Advanced Materials Technologies. 2019; 4(3): 1800652 (11 pp.). https://doi.org/10.1002/admt.201800652
    DORA PSI
  • Greber T, Seitsonen AP, Hemmi A, Dreiser J, Stania R, Matsui F, et al.
    Circular dichroism and angular deviation in x-ray absorption spectra of Dy2ScN@ C80 single-molecule magnets on h-BN/Rh(111)
    Physical Review Materials. 2019; 3(1): 14409. https://doi.org/10.1103/PhysRevMaterials.3.014409
    DORA PSI
  • Svetina C, Mankowsky R, Knopp G, Koch F, Seniutinas G, Rösner B, et al.
    Towards X-ray transient grating spectroscopy
    Optics Letters. 2019; 44(3): 574-577. https://doi.org/10.1364/OL.44.000574
    DORA PSI
  • Moradi M, Opara NL, Tulli LG, Wäckerlin C, Dalgarno SJ, Teat SJ, et al.
    Supramolecular architectures of molecularly thin yet robust free-standing layers
    Science Advances. 2019; 5(2): eaav4489 (7 pp.). https://doi.org/10.1126/sciadv.aav4489
    DORA PSI
  • Rösner B, Dudin P, Bosgra J, Hoesch M, David C
    Zone plates for angle-resolved photoelectron spectroscopy providing sub-micrometre resolution in the extreme ultraviolet regime
    Journal of Synchrotron Radiation. 2019; 26(2): 467-472. https://doi.org/10.1107/S1600577519000869
    DORA PSI
  • Nida S, Tsibizov A, Ziemann T, Woerle J, Moesch A, Schulze-Briese C, et al.
    Silicon carbide X-ray beam position monitors for synchrotron applications
    Journal of Synchrotron Radiation. 2019; 26(1): 28-35. https://doi.org/10.1107/S1600577518014248
    DORA PSI
  • Crha J, Vila-Comamala J, Lehmann E, David C, Trtik P
    Light yield enhancement of 157-gadolinium oxysulfide scintillator screens for the high-resolution neutron imaging
    MethodsX. 2019; 6: 107-114. https://doi.org/10.1016/j.mex.2018.12.005
    DORA PSI
  • Makita M, Vartiainen I, Mohacsi I, Caleman C, Diaz A, Jönsson HO, et al.
    Femtosecond phase-transition in hard x-ray excited bismuth
    Scientific Reports. 2019; 9(1): 602 (7 pp.). https://doi.org/10.1038/s41598-018-36216-3
    DORA PSI
  • Heldt G, Thompson P, Chopdekar RV, Kohlbrecher J, Lee S, Heyderman LJ, et al.
    Characterisation of size distribution and positional misalignment of nanoscale islands by small-angle X-ray scattering
    Journal of Applied Physics. 2019; 125(1): 014301 (8 pp.). https://doi.org/10.1063/1.5050882
    DORA PSI
  • Gottlieb S, Rösner B, Evangelio L, Fernández-Regúlez M, Nogales A, García-Gutiérrez MC, et al.
    Self-assembly morphology of block copolymers in sub-10 nm topographical guiding patterns
    Molecular Systems Design & Engineering. 2019; 4(1): 175-185. https://doi.org/10.1039/c8me00046h
    DORA PSI
  • Krempaský J, Fanciulli M, Pilet N, Minár J, Khan W, Muntwiler M, et al.
    Spin-resolved electronic structure of ferroelectric α-GeTe and multiferroic Ge1–xMnxTe
    Journal of Physics and Chemistry of Solids. 2019; 128: 237-244. https://doi.org/10.1016/j.jpcs.2017.11.010
    DORA PSI
  • Kagias M, Wang Z, Guzenko VA, David C, Stampanoni M, Jefimovs K
    Fabrication of Au gratings by seedless electroplating for X-ray grating interferometry
    Materials Science in Semiconductor Processing. 2019; 92: 73-79. https://doi.org/10.1016/j.mssp.2018.04.015
    DORA PSI
  • Ekinci Y, Garvey T, Rivkin L, Streun A, Wrulich A
    A compact high-brightness accelerator-based EUV source for actinic mask inspection
    In: Optics InfoBase Conference Papers. Vol. Part F85-EUVXRAY 2018. OSA - The Optical Society; 2018. https://doi.org/10.1364/EUVXRAY.2018.ET3B.5
    DORA PSI
  • Fernandez S, Kazazis D, Rajeev R, Mochi I, Helfenstein P, Yoshitake S, et al.
    A comparative study of EUV absorber materials using lensless actinic imaging of EUV photomasks
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297381
    DORA PSI
  • Mochi I, Rajeev R, Helfenstein P, Fernandez S, Kazazis D, Ekinci Y
    Through-pellicle inspection of EUV masks
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297436
    DORA PSI
  • Castellanos S, Wu L, Baljozovic M, Portale G, Kazazis D, Vockenhuber M, et al.
    Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297167
    DORA PSI
  • Manouras T, Kazazis D, Koufakis E, Ekinci Y, Vamvakaki M, Argitis P
    Ultra-sensitive EUV resists based on acid-catalyzed polymer backbone breaking
    In: Goldberg KA, ed. SPIE advanced lithography. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2299853
    DORA PSI
  • Wang X, Tseng L-T, Kazazis D, Tasdemir Z, Vockenhuber M, Mochi I, et al.
    Studying resist performance for contact holes printing using EUV interference lithography
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2501949
    DORA PSI
  • Rajeev R, Mochi I, Kazazis D, Fernandez S, Li-Teng T, Helfenstein P, et al.
    Phase defect inspection on EUV masks using RESCAN
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2502726
    DORA PSI
  • Tasdemir Z, Vockenhuber M, Mochi I, Garrido Olvera K, Meeuwissen M, Yildirim O, et al.
    Chemically-amplified EUV resists approaching 11nm half-pitch
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2299643
    DORA PSI
  • Krempaský J, Koch F, Vagovič P, Mikeš L, Jaggi A, Svetina C, et al.
    Inspecting adaptive optics with at-wavelength wavefront metrology
    In: Spiga D, Mimura H, eds. Adaptive X-ray optics V. Vol. 10761. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2320532
    DORA PSI
  • Rantala J, Gädda T, Laukkanen M, Nguyen Dang L, Karaste K, Kazazis D, et al.
    New resist and underlayer approaches toward EUV lithography
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2503107
    DORA PSI
  • Dejkameh A, Erdmann A, Evanschitzky P, Ekinci Y
    Fourier ptychography for lithography high NA systems
    In: Smith DG, Wyrowski F, Erdmann A, eds. Computational optics II. Vol. 10694. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2311332
    DORA PSI
  • Tasdemir Z, Wang X, Mochi I, van Lent-Protasova L, Meeuwissen M, Custers R, et al.
    Evaluation of EUV resists for 5 nm technology node and beyond
    In: Ronse KG, Hendrickx E, Naulleau PP, Gargini PA, Itani T, eds. International conference on extreme ultraviolet lithography 2018. Vol. 10809. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2502688
    DORA PSI
  • Popescu C, Kazazis D, McClelland A, Dawson G, Roth J, Theis W, et al.
    High-resolution EUV lithography using a multi-trigger resist
    In: Goldberg KA, ed. Extreme ultraviolet (EUV) lithography IX. Vol. 10583. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2297406
    DORA PSI
  • Popescu C, McClelland A, Kazazis D, Dawson G, Roth J, Ekinci Y, et al.
    Multi-trigger resist for electron beam and extreme ultraviolet lithography
    In: Behringer UFW, Finders J, eds. 34th European mask and lithography conference. Vol. 10775. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2316628
    DORA PSI
  • Ekinci Y, Garvey T, Streun A, Wrulich A, Rivkin L
    A high-brightness accelerator-based EUV source for metrology applications
    In: Gallagher EE, Rankin JH, eds. Photomask technology 2018. Vol. 10810. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2501930
    DORA PSI
  • Mochi I, Timmermans M, Gallagher E, Mariano M, Pollentier I, Rajeev R, et al.
    Experimental evaluation of the impact of EUV pellicles on reticle imaging
    In: Gallagher EE, Rankin JH, eds. Photomask technology 2018. Vol. 10810. Proceedings of SPIE. Bellingham, WA, USA: SPIE; 2018. https://doi.org/10.1117/12.2502480
    DORA PSI
  • Matmon G, Ginossar E, Villis BJ, Kölker A, Lim T, Solanki H, et al.
    Two- to three-dimensional crossover in a dense electron liquid in silicon
    Physical Review B. 2018; 97: 155306 (8 pp.). https://doi.org/10.1103/PhysRevB.97.155306
    DORA PSI
  • Chikina A, Lechermann F, Husanu M-A, Caputo M, Cancellieri C, Wang X, et al.
    Orbital ordering of the mobile and localized electrons at oxygen-deficient LaAlO3/SrTiO3 interfaces
    ACS Nano. 2018; 12(8): 7927-7935. https://doi.org/10.1021/acsnano.8b02335
    DORA PSI
  • Fallica R, Haitjema J, Wu L, Castellanos S, Brouwer AM, Ekinci Y
    Absorption coefficient of metal-containing photoresists in the extreme ultraviolet
    2018. https://doi.org/10.1117/1.JMM.17.2.023505
    DORA PSI
  • Rau C, Shi X, Zdora M, Zanette I, David C
    Multi-Scale Imaging at the Coherence and Imaging Beamline I13 at Diamond
    Microscopy and Microanalysis. 2018; 24: 256. https://doi.org/10.1017/S1431927618013624
    DORA PSI
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    In: Itani T, Ronse KG, Gargini PA, Naulleau PP, eds. Vol. 10450. Proceedings of SPIE - the international society for optical engineering. SPIE; 2017. https://doi.org/10.1117/12.2280528
    DORA PSI
  • Schift H, Chidambaram N, Altana M, Kirchner R
    Selective surface smoothening of 3D micro-optical elements
    In: Bencher C, ed. Vol. 10144. Proceedings of SPIE - the international society for optical engineering. SPIE; 2017. https://doi.org/10.1117/12.2256358
    DORA PSI
  • Haitjema J, Zhang Y, Vockenhuber M, Kazazis D, Ekinci Y, Brouwer AM
    Extreme ultraviolet patterning of tin-oxo cages
    In: Goldberg KA, Panning EM, eds. Vol. 10143. Proceedings of SPIE - the international society for optical engineering. SPIE; 2017. https://doi.org/10.1117/12.2257911
    DORA PSI
  • Nagahara S, Carcasi M, Shiraishi G, Nakagawa H, Dei S, Shiozawa T, et al.
    Photosensitized Chemically Amplified Resist (PSCAR) 2.0 for high-Throughput and high-resolution EUV lithography: Dual photosensitization of acid generation and quencher decomposition by flood exposure
    In: Hohle CK, ed. Vol. 10146. Proceedings of SPIE - the international society for optical engineering. SPIE; 2017. https://doi.org/10.1117/12.2258217
    DORA PSI
  • Fallica R, Haitjema J, Wu L, Castellanos S, Brouwer F, Ekinci Y
    Absorption coefficient and exposure kinetics of photoresists at EUV
    In: Goldberg KA, Panning EM, eds. Vol. 10143. Proceedings of SPIE - the international society for optical engineering. SPIE; 2017. https://doi.org/10.1117/12.2257240
    DORA PSI
  • Rösner B, Schmidt U, Fink RH
    In-operando studies of Ag-TCNQ nanocrystals using Raman and soft x-ray microspectroscopy
    In: Rau C, ed. Vol. 849. Journal of physics: conference series. Institute of Physics Publishing; 2017. https://doi.org/10.1088/1742-6596/849/1/012016
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  • Greving I, Ogurreck M, Marschall F, Last A, Wilde F, Dose T, et al.
    Nanotomography endstation at the P05 beamline: Status and perspectives
    In: Rau C, ed. Vol. 849. Journal of physics: conference series. Institute of Physics Publishing; 2017. https://doi.org/10.1088/1742-6596/849/1/012056
    DORA PSI
  • Rajendran R, Mochi I, Helfenstein P, Mohacsi I, Redford S, Mozzanica A, et al.
    Towards a stand-alone high-throughput EUV actinic photomask inspection tool: RESCAN
    In: Sanchez MI, Ukraintsev VA, eds. Metrology, inspection, and process control for microlithography XXXI. Vol. 10145. Proceedings of SPIE. Bellingham, Washington: SPIE; 2017. https://doi.org/10.1117/12.2258379
    DORA PSI
  • Karim W, Spreafico C, Kleibert A, Gobrecht J, VandeVondele J, Ekinci Y, et al.
    Catalyst support effects on hydrogen spillover
    Nature. 2017; 541(7635): 68-71. https://doi.org/10.1038/nature20782
    DORA PSI
  • Alekhin MS, Patton G, Dujardin C, Douissard P-A, Lebugle M, Novotny L, et al.
    Stimulated scintillation emission depletion X-ray imaging
    Optics Express. 2017; 25(2): 654-669. https://doi.org/10.1364/OE.25.000654
    DORA PSI
  • Piquero-Zulaica I, Nowakowska S, Ortega JE, Stöhr M, Gade LH, Jung TA, et al.
    Temperature dependence of the partially localized state in a 2D molecular nanoporous network
    Applied Surface Science. 2017; 391: 39-43. https://doi.org/10.1016/j.apsusc.2016.02.227
    DORA PSI
  • Privitera SMS, Litrico G, Camarda M, Piluso N, La Via F
    Electrical properties of extended defects in 4H-SiC investigated by photoinduced current measurements
    Applied Physics Express. 2017; 10(3): 36601. https://doi.org/10.7567/APEX.10.036601
    DORA PSI
  • Oezelt H, Kirk E, Wohlhüter P, Müller E, Heyderman LJ, Kovacs A, et al.
    Vortex motion in amorphous ferrimagnetic thin film elements
    AIP Advances. 2017; 7(5): 056001 (5 pp.). https://doi.org/10.1063/1.4973295
    DORA PSI
  • Warnicke P, Wohlhüter P, Suszka AK, Stevenson SE, Heyderman LJ, Raabe J
    Tunable magnetic vortex resonance in a potential well
    Physical Review B. 2017; 96(17): 174402 (5 pp.). https://doi.org/10.1103/PhysRevB.96.174402
    DORA PSI
  • Wäckerlin A, Fatayer S, Nijs T, Nowakowska S, Mousavi SF, Popova O, et al.
    Molecular Chessboard Assemblies Sorted by Site-Specific Interactions of Out-of-Plane d-Orbitals with a Semimetal Template
    Nano Letters. 2017; 17(3): 1956-1962. https://doi.org/10.1021/acs.nanolett.6b05344
    DORA PSI
  • Kaspar C, Butschke J, Irmscher M, Martens S, Sailer H, Kirchner R, et al.
    Adjustable sidewall slopes by electron-beam exposure layout
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2017; 35(6): 06G501. https://doi.org/10.1116/1.4993724
    DORA PSI
  • Romano L, Vila-Comamala J, Schift H, Stampanoni M, Jefimovs K
    Hot embossing of Au- and Pb-based alloys for x-ray grating fabrication
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2017; 35(6): 06G302. https://doi.org/10.1116/1.4991807
    DORA PSI
  • Fallica R, Kazazis D, Kirchner R, Voigt A, Mochi I, Schift H, et al.
    Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2017; 35(6): 61603. https://doi.org/10.1116/1.5003476
    DORA PSI
  • Rösner B, Döring F, Ribič PR, Gauthier D, Principi E, Masciovecchio C, et al.
    High resolution beam profiling of X-ray free electron laser radiation by polymer imprint development
    Optics Express. 2017; 25(24): 30686-30695. https://doi.org/10.1364/OE.25.030686
    DORA PSI
  • Makita M, Karvinen P, Guzenko VA, Kujala N, Vagovic P, David C
    Fabrication of diamond diffraction gratings for experiments with intense hard x-rays
    Microelectronic Engineering. 2017; 176: 75-78. https://doi.org/10.1016/j.mee.2017.02.002
    DORA PSI
  • Marschall F, Vila-Comamala J, Guzenko VA, David C
    Systematic efficiency study of line-doubled zone plates
    Microelectronic Engineering. 2017; 177: 25-29. https://doi.org/10.1016/j.mee.2017.01.017
    DORA PSI
  • Roedig P, Ginn HM, Pakendorf T, Sutton G, Harlos K, Walter TS, et al.
    High-speed fixed-target serial virus crystallography
    Nature Methods. 2017; 14(8): 805-810. https://doi.org/10.1038/nmeth.4335
    DORA PSI
  • Lebugle M, Seniutinas G, Marschall F, Guzenko VA, Grolimund D, David C
    Tunable kinoform x-ray beam splitter
    Optics Letters. 2017; 42(21): 4327-4330. https://doi.org/10.1364/OL.42.004327
    DORA PSI
  • Gliga S, Hrkac G, Donnelly C, Büchi J, Kleibert A, Cui J, et al.
    Emergent dynamic chirality in a thermally driven artificial spin ratchet
    Nature Materials. 2017; 16(11): 1106-1111. https://doi.org/10.1038/NMAT5007
    DORA PSI
  • Tseng LT, Suter A, Wang YR, Xiang FX, Bian P, Ding X, et al.
    Intrinsic and spatially nonuniform ferromagnetism in Co-doped ZnO films
    Physical Review B. 2017; 96(10): 104423. https://doi.org/10.1103/PhysRevB.96.104423
    DORA PSI
  • Müller V, Shao F, Baljozovic M, Moradi M, Zhang Y, Jung T, et al.
    Structural Characterization of a Covalent Monolayer Sheet Obtained by Two-Dimensional Polymerization at an Air/Water Interface
    Angewandte Chemie International Edition. 2017; 56(48): 15262-15266. https://doi.org/10.1002/anie.201707140
    DORA PSI
  • Moradi M, Tulli LG, Nowakowski J, Baljozovic M, Jung TA, Shahgaldian P
    Two-dimensional calix[4]arene-based metal-organic coordination networks of tunable crystallinity
    Angewandte Chemie International Edition. 2017; 56(46): 14395-14399. https://doi.org/10.1002/anie.201703825
    DORA PSI
  • Finizio S, Wintz S, Kirk E, Suszka AK, Gliga S, Wohlhüter P, et al.
    Control of the gyration dynamics of magnetic vortices by the magnetoelastic effect
    Physical Review B. 2017; 96(5): 054438 (6 pp.). https://doi.org/10.1103/PhysRevB.96.054438
    DORA PSI
  • Lebugle M, Liebi M, Wakonig K, Guzenko VA, Holler M, Menzel A, et al.
    High-acceptance versatile microfocus module based on elliptical Fresnel zone plates for small-angle X-ray scattering
    Optics Express. 2017; 25(18): 21145-21158. https://doi.org/10.1364/OE.25.021145
    DORA PSI
  • Farhan A, Derlet PM, Anghinolfi L, Kleibert A, Heyderman LJ
    Magnetic charge and moment dynamics in artificial kagome spin ice
    Physical Review B. 2017; 96(6): 064409 (9 pp.). https://doi.org/10.1103/PhysRevB.96.064409
    DORA PSI
  • Spreafico C, Karim W, Ekinci Y, Van Bokhoven JA, VandeVondele J
    Hydrogen Adsorption on Nanosized Platinum and Dynamics of Spillover onto Alumina and Titania
    Journal of Physical Chemistry C. 2017; 121(33): 17862-17872. https://doi.org/10.1021/acs.jpcc.7b03733
    DORA PSI
  • Marschall F, McNally D, Guzenko VA, Rösner B, Dantz M, Lu X, et al.
    Zone plates as imaging analyzers for resonant inelastic x-ray scattering
    Optics Express. 2017; 25(14): 15624-15634. https://doi.org/10.1364/OE.25.015624
    DORA PSI
  • Bingham NS, Suszka AK, Vaz CAF, Kim H, Heyderman LJ
    Interfacial room temperature magnetism and enhanced magnetocaloric effect in strained La0.66Ca0.34MnO3/BaTiO3 heterostructures
    Physical Review B. 2017; 96(2): 024419 (6 pp.). https://doi.org/10.1103/PhysRevB.96.024419
    DORA PSI
  • Wang X-Y, Dienel T, Di Giovannantonio M, Borin Barin G, Kharche N, Deniz O, et al.
    Heteroatom-doped perihexacene from a double helicene precursor: on-surface synthesis and properties
    Journal of the American Chemical Society. 2017; 139(13): 4671-4674. https://doi.org/10.1021/jacs.7b02258
    DORA PSI
  • Gerber S, Yang S-L, Zhu D, Soifer H, Sobota JA, Rebec S, et al.
    Femtosecond electron-phonon lock-in by photoemission and x-ray free-electron laser
    Science. 2017; 357(6346): 71-75. https://doi.org/10.1126/science.aak9946
    DORA PSI
  • Windsor YW, Piamonteze C, Ramakrishnan M, Scaramucci A, Rettig L, Huever JA, et al.
    Magnetic properties of strained multiferroic CoCr2O4: a soft x-ray study
    Physical Review B. 2017; 95(22): 224413 (15 pp.). https://doi.org/10.1103/PhysRevB.95.224413
    DORA PSI
  • Fallica R, Kirchner R, Schift H, Ekinci Y
    High-resolution grayscale patterning using extreme ultraviolet interference lithography
    Microelectronic Engineering. 2017; 177: 1-5. https://doi.org/10.1016/j.mee.2017.01.007
    DORA PSI
  • Virganavičius D, Juodėnas M, Tamulevičius T, Schift H, Tamulevičius S
    Investigation of transient dynamics of capillary assisted particle assembly yield
    Applied Surface Science. 2017; 406: 136-143. https://doi.org/10.1016/j.apsusc.2017.02.100
    DORA PSI
  • Chidambaram N, Kirchner R, Fallica R, Yu L, Altana M, Schift H
    Selective Surface Smoothening of Polymer Microlenses by Depth Confined Softening
    Advanced Materials Technologies. 2017; 2(5): 20161038. https://doi.org/10.1002/admt.201700018
    DORA PSI
  • Opara N, Martiel I, Arnold SA, Braun T, Stahlberg H, Makita M, et al.
    Direct protein crystallization on ultrathin membranes for diffraction measurements at X-ray free-electron lasers
    Journal of Applied Crystallography. 2017; 50(3): 909-918. https://doi.org/10.1107/S1600576717005799
    DORA PSI
  • Jöhr R, Hinaut A, Pawlak R, Ząjac Ł, Olszowski P, Such B, et al.
    Thermally induced anchoring of a zinc-carboxyphenylporphyrin on rutile TiO2 (110)
    Journal of Chemical Physics. 2017; 146(18): 184704 (6 pp.). https://doi.org/10.1063/1.4982936
    DORA PSI
  • Haase J, Bagiante S, Sigg H, van Bokhoven JA
    Surface enhanced infrared absorption of chemisorbed carbon monoxide using plasmonic nanoantennas
    Optics Letters. 2017; 42(10): 1931-1934. https://doi.org/10.1364/OL.42.001931
    DORA PSI
  • Woerle J, Camarda M, Schneider CW, Sigg H, Grossner U, Gobrecht J
    Analysis of thin thermal oxides on (0001) sic epitaxial layers
    In: Zekentes K, Vasilevskiy KV, Frangis N, eds. Silicon carbide and related materials 2016. Vol. 897. Materials science forum. Switzerland: Trans Tech Publications; 2017. https://doi.org/10.4028/www.scientific.net/MSF.897.119
    DORA PSI
  • Müller V, Hungerland T, Baljozovic M, Jung T, Spencer ND, Eghlidi H, et al.
    Ink-Free Reversible Optical Writing in Monolayers by Polymerization of a Trifunctional Monomer: Toward Rewritable “Molecular Paper”
    Advanced Materials. 2017; 29(27): 1701220. https://doi.org/10.1002/adma.201701220
    DORA PSI
  • Karim W, Tschupp SA, Herranz J, Schmidt TJ, Ekinci Y, van Bokhoven JA
    State-of-the-art nanofabrication in catalysis
    Chimia. 2017; 71(4): 160-169. https://doi.org/10.2533/chimia.2017.160
    DORA PSI
  • Shimamoto K, Mukherjee S, Bingham NS, Suszka AK, Lippert T, Niedermayer C, et al.
    Single-axis-dependent structural and multiferroic properties of orthorhombic RMnO3(R = Gd-Lu)
    Physical Review B. 2017; 95(18): 184105 (9 pp.). https://doi.org/10.1103/PhysRevB.95.184105
    DORA PSI
  • Dübner M, Cadarso VJ, Gevrek TN, Sanyal A, Spencer ND, Padeste C
    Reversible Light-Switching of Enzymatic Activity on Orthogonally Functionalized Polymer Brushes
    ACS Applied Materials and Interfaces. 2017; 9(11): 9245-9249. https://doi.org/10.1021/acsami.7b01154
    DORA PSI
  • Woerle J, Bisti F, Husanu M-A, Strocov VN, Schneider CW, Sigg H, et al.
    Electronic band structure of the buried SiO2/SiC interface investigated by soft x-ray ARPES
    Applied Physics Letters. 2017; 110(13): 132101 (5 pp.). https://doi.org/10.1063/1.4979102
    DORA PSI
  • Monshipouri M, Abdi Y, Darbari S, Tsujino S
    Multiphoton photoemission of gold nanopillars fabricated by carbon nanotube templates
    Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 2017; 35(2): 02C110. https://doi.org/10.1116/1.4978655
    DORA PSI
  • Zabel T, Geiger R, Marin E, Müller E, Diaz A, Bonzon C, et al.
    Top-down method to introduce ultra-high elastic strain
    Journal of Materials Research. 2017; 32(4): 726-736. https://doi.org/10.1557/jmr.2017.31
    DORA PSI
  • Mohacsi I, Vartiainen I, Rösner B, Guizar-Sicairos M, McNulty I, David C
    Interlaced zone plate optics for hard X-ray imaging in the 10 nm range
    Scientific Reports. 2017; 7: 43624. https://doi.org/10.1038/srep43624
    DORA PSI
  • Romano L, Vila-Comamala J, Kagias M, Vogelsang K, Schift H, Stampanoni M, et al.
    High aspect ratio metal microcasting by hot embossing for X-ray optics fabrication
    Microelectronic Engineering. 2017; 176: 6-10. https://doi.org/10.1016/j.mee.2016.12.032
    DORA PSI
  • Külah E, Marot L, Steiner R, Romanyuk A, Jung TA, Wäckerlin A, et al.
    Surface chemistry of rare-earth oxide surfaces at ambient conditions: Reactions with water and hydrocarbons
    Scientific Reports. 2017; 7: 43369. https://doi.org/10.1038/srep43369
    DORA PSI
  • Ribič PR, Rösner B, Gauthier D, Allaria E, Döring F, Foglia L, et al.
    Extreme-ultraviolet vortices from a free-electron laser
    Physical Review X. 2017; 7(3): 31036. https://doi.org/10.1103/PhysRevX.7.031036
    DORA PSI
  • Pedrini B, Menzel A, Guzenko VA, David C, Abela R, Gutt C
    Model-independent particle species disentanglement by X-ray cross-correlation scattering
    Scientific Reports. 2017; 7: 45618. https://doi.org/10.1038/srep45618
    DORA PSI
  • Seniutinas G, Balčytis A, Reklaitis I, Chen F, Davis J, David C, et al.
    Tipping solutions: Emerging 3D nano-fabrication/-imaging technologies
    Nanophotonics. 2017; 6(5): 923-941. https://doi.org/10.1515/nanoph-2017-0008
    DORA PSI
  • Marschall F, Yin Z, Rehanek J, Beye M, Döring F, Kubiček K, et al.
    Transmission zone plates as analyzers for efficient parallel 2D RIXS-mapping
    Scientific Reports. 2017; 7(1): 8849. https://doi.org/10.1038/s41598-017-09052-0
    DORA PSI
  • Zdora M-C, Vila-Comamala J, Schulz G, Khimchenko A, Hipp A, Cook AC, et al.
    X-ray phase microtomography with a single grating for high-throughput investigations of biological tissue
    Biomedical Optics Express. 2017; 8(2): 1257-1270. https://doi.org/10.1364/BOE.8.001257
    DORA PSI
  • Krieger JA, Chang C-Z, Husanu MA, Sostina D, Ernst A, Otrokov MM, et al.
    Spectroscopic perspective on the interplay between electronic and magnetic properties of magnetically doped topological insulators
    Physical Review B. 2017; 96(18): 184402. https://doi.org/10.1103/PhysRevB.96.184402
    DORA PSI
  • Buzzi M, Makita M, Howald L, Kleibert A, Vodungbo B, Maldonado P, et al.
    Single-shot Monitoring of Ultrafast Processes via X-ray Streaking at a Free Electron Laser
    Scientific Reports. 2017; 7(1): 7069. https://doi.org/10.1038/s41598-017-07069-z
    DORA PSI
  • Schift H
    High-aspect-ratio nanoimprint process chains
    Microsystems and Nanoengineering. 2017; 3. https://doi.org/10.1038/micronano.2017.17
    DORA PSI
  • Wiktor MI, Weichert D, Howe N, Huang C-Y, Olieric V, Boland C, et al.
    Structural insights into the mechanism of the membrane integral N-acyltransferase step in bacterial lipoprotein synthesis
    Nature Communications. 2017; 8: 15952. https://doi.org/10.1038/ncomms15952
    DORA PSI
  • Kayser Y, David C, Flechsig U, Krempasky J, Schlott V, Abela R
    X-ray grating interferometer for in situ and at-wavelength wavefront metrology
    Journal of Synchrotron Radiation. 2017; 24(1): 150-162. https://doi.org/10.1107/S1600577516017562
    DORA PSI
  • Van Schoot J, Schift H
    Next-generation lithography - An outlook on EUV projection and nanoimprint
    Advanced Optical Technologies. 2017; 6(3-4): 159-162. https://doi.org/10.1515/aot-2017-0040
    DORA PSI
  • Rehanek J, Makita M, Wiegand P, Heimgartner P, Pradervand C, Seniutinas G, et al.
    The hard X-ray Photon Single-Shot Spectrometer of SwissFEL - Initial characterization
    Journal of Instrumentation. 2017; 12(5): P05024 (13 pp.). https://doi.org/10.1088/1748-0221/12/05/P05024
    DORA PSI
  • Girovsky J, Nowakowski J, Ali ME, Baljozovic M, Rossmann HR, Nijs T, et al.
    Long-range ferrimagnetic order in a two-dimensional supramolecular Kondo lattice
    Nature Communications. 2017; 8: 15388. https://doi.org/10.1038/ncomms15388
    DORA PSI
  • Dübner M, Naoum M-E, Spencer ND, Padeste C
    From pH- to Light-Response: Postpolymerization Modification of Polymer Brushes Grafted onto Microporous Polymeric Membranes
    ACS Omega. 2017; 2(2): 455-461. https://doi.org/10.1021/acsomega.6b00394
    DORA PSI
  • Szmyt W, Vogel S, Diaz A, Holler M, Gobrecht J, Calame M, et al.
    Protective effect of ultrathin alumina film against diffusion of iron into carbon fiber during growth of carbon nanotubes for hierarchical composites investigated by ptychographic X-ray computed tomography
    Carbon. 2017; 115: 347-362. https://doi.org/10.1016/j.carbon.2016.12.085
    DORA PSI
  • Muntwiler M, Zhang J, Stania R, Matsui F, Oberta P, Flechsig U, et al.
    Surface science at the PEARL beamline of the Swiss Light Source
    Journal of Synchrotron Radiation. 2017; 24(1): 354-366. https://doi.org/10.1107/S1600577516018646
    DORA PSI
  • Mojarad N, Pfohl T, Ekinci Y
    Soft electrostatic trapping in nanofluidics
    Microsystems and Nanoengineering. 2017; 3. https://doi.org/10.1038/micronano.2017.51
    DORA PSI
  • Haitjema J, Zhang Y, Vockenhuber M, Kazazis D, Ekinci Y, Brouwer AM
    Extreme ultraviolet patterning of tin-oxo cages
    Journal of Micro/Nanolithography, MEMS, and MOEMS. 2017; 16(3): 033510 (7 pp.). https://doi.org/10.1117/1.JMM.16.3.033510
    DORA PSI
  • Helfenstein P, Mochi I, Rajeev R, Fernandez S, Ekinci Y
    Coherent diffractive imaging methods for semiconductor manufacturing
    Advanced Optical Technologies. 2017; 6(6): 439-448. https://doi.org/10.1515/aot-2017-0052
    DORA PSI
  • Fan D, Sigg H, Spolenak R, Ekinci Y
    Strain and thermal conductivity in ultrathin suspended silicon nanowires
    Physical Review B. 2017; 96(11): 115307. https://doi.org/10.1103/PhysRevB.96.115307
    DORA PSI
  • Mochi I, Helfenstein P, Mohacsi I, Rajeev R, Kazazis D, Yoshitake S, et al.
    RESCAN: An actinic lensless microscope for defect inspection of EUV reticles
    2017. https://doi.org/10.1117/1.JMM.16.4.041003
    DORA PSI
  • Gerspach MA, Mojarad N, Sharma D, Pfohl T, Ekinci Y
    Nanofluidic lab-on-a-chip trapping devices for screening electrostatics in concentration gradients
    Microelectronic Engineering. 2017; 175: 17-22. https://doi.org/10.1016/j.mee.2016.12.017
    DORA PSI
  • Sharma D, Gerspach MA, Pfohl T, Lim RYH, Ekinci Y
    Single positively charged particle trapping in nanofluidic systems
    Microelectronic Engineering. 2017; 175: 43-49. https://doi.org/10.1016/j.mee.2017.01.001
    DORA PSI
Papers published from 2011 to 2016
List of Publications 2007 - 2011 (PDF)

Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Head a.i.
Dr. Yasin Ekinci

Secretary
Ms. Anne Sacher

Tel +41 56 310 2814
Fax +41 56 310 2646
Email: annekathrin.sacher@psi.ch

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