2024 SPIE Advanced Lithography + Patterning symposium hosted leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. The symposium features six conference topics.
At the conference of Metrology, Inspection, and Process Control XXXVIII, Tao Shen’s presentation entitled ‘EUV reflectometry and scatterometry for thin layer and periodic structure characterization’ won the 2024 Karel Urbánek Best Student Paper Award. The award recognizes the most promising contribution to the field by a student, based on the technical merit and persuasiveness of the paper presentation at the conference.
In Tao’s presentation, he presented the results of optical constants (n and k) determination and layer thickness characterization with EUV reflectometry for an EUV attenuated phase shifting photomask blank. He also showcased the line-space grating profile reconstruction and overlay measurement with EUV scatterometry. The work was conducted at the reflective grazing incidence nanoscope for EUV (REGINE) end-station at the Swiss Light Source.