Scientific Highlights and News
The technology transfer centre Swiss PIC will be located in the Park Innovaare.
We are happy to announce that Alex has been awarded the 2022 Nicholas Kurti Science prize. The prize recognises his work on non-linear effects in Josephson junctions for quantum information processing.
The real-world application of this type of quantum computing gets one step closer with a new method to capture errors while qubits are talking to each other.
PSI and ETH Zurich have founded the Quantum Computing Hub, where top researchers work together on concepts for quantum computers.
Kirsten Moselund heads the new Laboratory for Nano and Quantum Technologies. In this interview she discusses quantum research at PSI and how nanophotonics can assist with this.
Der Wettlauf um den QuantencomputerForschung online erleben
Sehen Sie hier die Aufzeichnung des Live-Video-Rundgangs vom 23. August 2023
Starting in Novemeber 2022, Dr. Kevin Anthony Hofhuis joined the Nanotechnology group as an E-beam Lithography Scientist.
Welcome to the cleanroom team, Kevin!
On April 11th, we had the opportunity to celebrate the kick-off meeting of the new Laboratory of Nano and Quantum Technologies (LNQ), and many had the chance to meet their new colleagues for the first time. Presently, our lab joins together two cleanroom-technology focused groups, Nanotechnology led by Dr. Vitaliy Guzenko and Advanced Nanomanufacturing by Dr. Helmut Schift, respectively, with groups focusing on three different technology platforms in quantum computing. These are Ion trap Quantum Computing led by Dr. Cornelius Hempel, Superconducting Quantum Circuits that is an extension of Prof. Andreas Wallraff's activities at ETHZ, and Neutral Atoms Quantum Engineering, which will be led by Prof. Wenchao Xu joining in August.
Keyence VK-X3100 is a non-contact 3D surface profiler. It enables capturing images and performing the profile, roughness and film thickness analysis. The measurement head is equipped with semiconductor laser with the wave length of 404 nm and white LED. To reach the best performance, it uses laser confocal scanning, focus variation, adn while light interferometry measurement methods. The motorized sample stage allows for automatic inspection of up to 200mm wafers.
SPTS Rapier system for Si deep reactive ion etching (DRIE) is released for user operation. The system is acquired by PSI as a part of SNF R’Equip project “Advanced Si DRIE tool for highly uniform ultra-deep structuring (SiDRY)”. This versatile tool is equipped with pulsed bias option and sensitive ClaritasTM optical end point detection system. Electrostatic clamping and wafer edge protection systems are both available for three wafer diameters – 100 mm, 150 mm, and 200 mm.