Scientific Highlights and News

Scientific Highlights

22. September 2022

Alexander Grimm wins 2022 Nicholas Kurti prize

We are happy to announce that Alex has been awarded the 2022 Nicholas Kurti Science prize. The prize recognises his work on non-linear effects in Josephson junctions for quantum information processing.

14. September 2022

Capturing control errors in quantum annealing

The real-world application of this type of quantum computing gets one step closer with a new method to capture errors while qubits are talking to each other.

20. Juli 2022

Solving the unsolvable

Large Research Facilities Future Technologies Data Science

PSI and ETH Zurich have founded the Quantum Computing Hub, where top researchers work together on concepts for quantum computers.

25. Mai 2022
Kirsten Moselund

“If you’re in a certain position, you should step forward”

Materials Research Industrial co-operation Micro- and Nanotechnology Quantum Research

Kirsten Moselund heads the new Laboratory for Nano and Quantum Technologies. In this interview she discusses quantum research at PSI and how nanophotonics can assist with this.



16. Mai 2022

LNQ Kick-off

On April 11th, we had the opportunity to celebrate the kick-off meeting of the new Laboratory of Nano and Quantum Technologies (LNQ), and many had the chance to meet their new colleagues for the first time. Presently, our lab joins together two cleanroom-technology focused groups, Nanotechnology led by Dr. Vitaliy Guzenko and Advanced Nanomanufacturing by Dr. Helmut Schift, respectively, with groups focusing on three different technology platforms in quantum computing. These are Ion trap Quantum Computing led by Dr. Cornelius Hempel, Superconducting Quantum Circuits that is an extension of Prof. Andreas Wallraff's activities at ETHZ, and Neutral Atoms Quantum Engineering, which will be led by Prof. Wenchao Xu joining in August.

15. November 2021
Keyence optical 3D Profiler

New Confocal Microscope Keyence VK-X3100

Keyence VK-X3100 is a  non-contact 3D surface profiler. It enables capturing images and performing the profile, roughness and film thickness analysis. The measurement head is equipped with semiconductor laser with the wave length of 404 nm and white LED. To reach the best performance, it uses laser confocal scanning, focus variation, adn while light interferometry  measurement methods. The motorized sample stage allows for automatic inspection of up to 200mm wafers.

14. September 2020

Installation of SPTS Rapier Deep Reactive Ion Etcher

SPTS Rapier system for Si deep reactive ion etching (DRIE) is released for user operation. The system is acquired by PSI as a part of SNF R’Equip project “Advanced Si DRIE tool for highly uniform ultra-deep structuring (SiDRY)”. This versatile tool is equipped with pulsed bias option and sensitive ClaritasTM optical end point detection system. Electrostatic clamping and wafer edge protection systems are both available for three wafer diameters – 100 mm, 150 mm, and 200 mm.