Nanoimprint Lithography Facilities
LNQ's tools for Nanoimprint Lithography are placed in the „processing lab" is a semi-clean room of ca. 150 m2 with laminar flow boxes in the critical areas and a class 10’000 environment elsewhere. Our main isntruments are two hot-presses of the type Jenoptic HEX 03. They may be used for thermal imprint as well as for UV-assisited replication processes.
Main Features
The HEX 03 press operated at the LMN
- molding of thermoplastic polymers with resolutions of below 10nm pressing force up to 200kN (operation force/position controlled)
- embossing temperature up to 320'C (heating electrical, cooling with oil)
- embossing under vacuum
- automatic mold release
- optical alignment with 3 um overlay accuracy for double sided I aligned embossing
Processes and Applications
Hot Embossing of Surfaces and Polymer Elements
- micro- and nanopatteming of polymer structures used for fluidics, optics, and surfaces with topological contrast
- laminating of polymer sheets
- molding of thin resists used for pattem transfer
- surface structuring with topological and chemical contrast