Lab News & Scientific Highlights

Photoresist materials are crucial in the manufacturing of computer chips, where the circuits are initially printed in the photoresist using photolithography. As the demand for smaller and more precise circuitry in computer chips grows, photoresists must resolve features with smaller sizes and higher density. One of the factors determining the ultimate resolution in lithography is the molecular size/mass of the photoresists.

13.08.2024

•Zukunftstechnologien

•6 min

Forschende zeigen, dass Computerchips noch kleiner werden könnten

Nanotechnologie

Forscher am PSI erreichen mit EUV-Lithografie eine noch nie dagewesene Auflösung von 5 Nanometern (half pitch).

06.07.2024

•Future Technologies

PSI-UCL-Surrey workshop on silicon and germanium based quantum devices

Materials research

Nanotechnology

Quantum research

A team of PSI scientists as well as collaborators from UCL and the University of Surrey met at the Fondazione Monte Verità to discuss results and trace the roadmap for future research into quantum devices based on silicon and germanium.

21.05.2024

Welcome to LXN Kajal Biju

Herzlich Willkommen Kajal Biju im LXN!

Yasin Ekinci, Leiter des Labors für Röntgen-Nanowissenschaften und Technologien am PSI, in einem Reinraumlabor der Synchrotron Lichtquelle Schweiz SLS, wo extremes Ultraviolett-Licht für die EUV-Forschung genutzt werden kann.

27.03.2024

•Zukunftstechnologien

•5 min

Neues Verfahren zur Herstellung von Halbleitern

Industry Relations

Nanotechnologie

Das Paul Scherrer Institut PSI arbeitet mit dem finnischen Unternehmen PiBond an der kommerziellen Nutzung hoch entwickelter Halbleiterprodukte, die mittels EUV-Lithografie hergestellt wurden.

At the Maloja experimental station of SwissFEL is a unique Jungfrau detector. This detector has been adapted to detect low energy ‘soft’ X-rays. (Photo: Paul Scherrer Institute / Mahir Dzambegovic)

14.03.2024

•Large research facilities

•11 min

Developing detectors to transform science with light (part 2)

SwissFEL

SLS

Part II: Why detecting soft X-rays is hard, and how a new breakthrough is set to transform low energy X-ray science.

Delay vs. photon energy map of an ammonium iron(III) oxalate solution. The large bandwidth emission covers the full XANES range, making time-consuming monochromator scans obsolete.

12.03.2024

Efficient transient X-ray absorption spectroscopy

By combining the unique large bandwidth emission mode of SwissFEL’s ARAMIS undulator and diffractive X-ray optics made of diamond, we have demonstrated a new method for time-resolved X-ray absorption near edge structure (XANES) spectroscopy that enables faster data acquisition and requires smaller sample quantities for high-quality data.

08.03.2024

2024 SPIE Advanced Lithography + Patterning, San Jose, California

2024 SPIE Advanced Lithography + Patterning symposium hosted leading researchers who are solving challenges in optical and EUV lithography, patterning technologies, metrology, and process integration for semiconductor manufacturing and adjacent applications. The symposium features six conference topics.

$Electrons whizzing through the kagome metal Fe3Sn2 are influenced by the proximity of a flat band (shown by the reflection of the top ball on a flat surface). This causes the electronic charge to be fractionalised, or split (shown here by the appearance of the lower ball). Researchers have now observed this effect spectroscopically.$