The ALM Group explores cutting-edge lithography and metrology techniques in the extreme ultraviolet (EUV) and soft X-ray (SXR) range. We operate the XIL-II beamline at the Swiss Light Source, a world-leading facility for EUV interference lithography, photoresist testing, and photomask and wafer inspection.
Beyond lithography, our research spans diverse fields of nanoscience and nanotechnology—including nanophotonics, plasmonics, nanofluidics, and nanocatalysis. By combining advanced nanofabrication with state-of-the-art characterization, we aim to deepen the understanding of nanoscale phenomena and unlock new opportunities for practical applications.