Endstations

Spatial resolutiondown to ~50 nm depending on sample
Electron energy resolution0.2 eV
Sample temperature50 K < T < 1'800 K
Field of view5 - 150 μm diameter

The permanent endstation of the SIM beamline is a Photoemission Electron microscope (PEEM) (Model: SPELEEM, Elmitec GmbH) with a motorized and rotatable sample stage. It allows one to image samples using the photoelectric effect with very high spatial resolution. With an additional energy analyzer these photoelectrons are then energy-selected. In addition to the grazing incidence X-ray illumination (16°), the sample can be illuminated by low energy electrons. In this low energy electron microscopy (LEEM) mode, additional contrast mechanisms are available. The PEEM is equipped with a small preparation chamber (sputtering, heating, load-lock), while a larger preparation system equipped with LEED and e-beam evaporators, is also available. 

When the sample is retracted, the light passes through the PEEM and can be used in a second endstation further downstream either focussed or unfocussed.

PEEM is a surface sensitive technique. Its depth of view is limited by the inelastic mean free path of the photoelectrons which is typically ~5 nm. The PEEM operates in UHV and with a high voltage (Va = 10-20 kV) to accelerate the excited photoelectrons into the microscope lenses to produce a magnified image of the intensity of the locally emitted electrons. 

For successful imaging in the PEEM the sample should meet the following conditions:

  • sample dimensions: diameter < 10 mm, thickness ~0.1-3 mm
  • UHV compatible (p < 10-8 mbar)
  • flat and conducting surfaces are likely to produce high quality images with good spatial resolution.

For more information please contact the beamline scientist (Carlos Vaz or Armin Kleibert).

Scientific applicationsSpectroscopy of electronic, chemical, and magnetic properties of advanced materials.
Experimental techniquesXAS, XMCD, XMLD
CharacteristicsUHV chamber with external electromagnet.
Detection modesTotal electron yield (TEY), total fluorescence yield (TFY)
Spot size at the sample~0.3 mm x 1.5 mm (H x V)
Sample requirementsSolid samples, up to 10 x 10 mm2 (surface area) and max. thickness of 1 mm.
Sample preparationNone
Sample environmentUHV 
Temperature range: 10 K to 400 K.
Temperature controlled heating.
Magnetic fieldDipolar electromagnet: ± 130 mT .
Magnetic field/photon helicity switching within 1-2 s. 
Possibility to do time-resolved polarization measurements.

A soft x-ray ptychography microscope (SOPHIE) operated by the Microspectroscopy Group enabling high spatial resolution (~5 nm) soft x-ray spectromicroscopy.

Call schedule

Call for proposals II-26
Experimental Period2026-II
Call09 February 2026
Submission deadline16 March 2026 (midnight)
Start period01 July 2026
End period14 December 2026
Notification of outcome26 May 2026

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