Paul Scherrer Institute

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The Thin Films and Interfaces Group

Thin films are nowadays utilized in many applications, ranging from semiconductor devices to optical coatings and are even present in pharmaceuticals (polymers). This wide-spread application of films with thicknesses from atomic monolayers to microns is due to the developments of thin film deposition techniques. Thin films are also important for studies of materials with new and unique properties due to the possibility of tuning their crystallographic and morphological properties. The thin film approach, i.e. the presence of interfaces (to a substrate or the film surface) adds more degrees of freedom for influencing the properties of materials, e.g. by lattice strain or surface functionalization. For these fundamental studies of material properties large research facilities such as synchrotron radiation or neutron spallation sources are one of the keys that the Paul Scherrer Institute (PSI) provides. Read more Top

PhD projects at the Thin Films and Interfaces Group

At present, we do not have open PhD positions available. As soon as we have details will be posted at our open position page. Other open positions are always published on the PSI Open Positions page.

News

Upcoming Conference

11th International Conference on Photo-Excited Processes and Applications

September 10-14, 2018
Vilnius, Lithuania
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2018 E-MRS Fall Meeting and Exhibit

September 18-21, 2018
Warsaw, Poland
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Upcoming Group Seminars

In situ Catalytic Reactions and Environmental Chemistry Modifications as seen by NAP-XPS - Abstract
Speaker: A. Boucly
Laboratories of Electrochemistry and Environmental Chemistry, PSI
Date: Monday 16 July 2018 16:00
Room: OFLG/402, TFI

Solid Oxide Interfaces for Faster Ion Transport - Abstract
Speaker: SOIFIT Workshop
Date: Tuesday 24 July 2018 9:00 - 18:30
Room: OFLG/402, TFI Workshop

Electroceramics for direct energy converters - Abstract
Speaker: Prof. Anke Weidenkaff
Institute for Materials Science - University of Stuttgart
Date: Monday 30 July 2018 16:00
Room: OFLG/402, TFI-LMX SEMINAR

TBA
Speaker: Hans Grimmer
Date: Tuesday 31 July 2018 13:00
Room: OSGA/EG06, LMX

TBA
Speaker: E. Gilardi
Date: Monday 13 August 2018 16:00
Room: OFLG/402, TFI

Special interview with Prof. Thomas Lippert (PSI and Principle Investigator at I2CNER, Kyushu University) and Prof. Tatsumi Ishihara (Associate Director I2CNER, Kyushu University) on Current and Future Energy Research and Development in Europe: Perspectives from Switzerland, Germany and Japan. The interview is being published in the August 2017 issue of the Energy Outlook of the International Institut for Carbon-Neutral Energy Research, I2CNER.
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Most recent Paper

Alejandro Ojeda-G-P, Max Döbeli, and Thomas Lippert
Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition
Adv. Mater. Interfaces, 1701062 (2018)


12 July 2018

Influence of Plume Properties on Thin Film Composition in Pulsed Laser Deposition

Abstract:
Maximum compositional deviations at PLD relevant angular areas (±10°) versus mass‐ratios, mainly for 1 × 10<sup>−2</sup> mbar Ar. Except for O/Mn and Li/Mn in which the maximum deviations already appear at 1 × 10<sup>−3</sup> mbar Ar. Symbols ◼ are for RBS measurements, ▴ for ERDA measurements, and ● for data from ref. 30. Note: O/Mn deviation has a high uncertainty due to the suspicion of ambient water trapping by the amorphous film. Error bars are smaller than the symbols except for EuAlO<sub>3</sub>. From Figure 5zoom
Maximum compositional deviations at PLD relevant angular areas (±10°) versus mass‐ratios, mainly for 1 × 10−2 mbar Ar. Except for O/Mn and Li/Mn in which the maximum deviations already appear at 1 × 10−3 mbar Ar. Symbols ◼ are for RBS measurements, ▴ for ERDA measurements, and ● for data from ref. 30. Note: O/Mn deviation has a high uncertainty due to the suspicion of ambient water trapping by the amorphous film. Error bars are smaller than the symbols except for EuAlO3. From Figure 5
Despite the apparent simplicity of pulsed laser deposition, consistent deposition of thin films with the desired thickness, composition, crystallinity, and quality still remains challenging. This article explores the influence of process parameters with respect to film thickness and composition, two key aspects for thin films which have a very strong effect on film properties, possible applications, and characterization. Using five perovskite materials, a systematic analysis of different process parameters, e.g., target material, deposition pressure, fluence, substrate temperature or target to substrate distance, is performed. The results are classified under target ablation, plasma expansion, and substrates effects, which provide vital guidance to reduce the degree of trial and error when producing thin films. Moreover, they enable the understanding of what should be considered, and avoided for the deposition of thin films.
Keywords: pulsed laser deposition; thin films; composition; thickness; control of;

Facility: Thin Films and Interfaces, LMX, ETHZ

Reference: A. Ojeda-G-P et al., Adv. Mater. Interfaces, 1701062 (2018)

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