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The Thin Films and Interfaces Group

Thin films are nowadays utilized in many applications, ranging from semiconductor devices to optical coatings and are even present in pharmaceuticals (polymers). This wide-spread application of films with thicknesses from atomic monolayers to microns is due to the developments of thin film deposition techniques. Thin films are also important for studies of materials with new and unique properties due to the possibility of tuning their crystallographic and morphological properties. The thin film approach, i.e. the presence of interfaces (to a substrate or the film surface) adds more degrees of freedom for influencing the properties of materials, e.g. by lattice strain or surface functionalization. For these fundamental studies of material properties large research facilities such as synchrotron radiation or neutron spallation sources are one of the keys that the Paul Scherrer Institute (PSI) provides. Read more Top

PhD projects at the Thin Films and Interfaces Group

At present, we do not have open PhD positions available. As soon as we have details will be posted at our open position page. Other open positions are always published on the PSI Open Positions page.


Upcoming Group Seminars

The Thin Films and Interfaces Group – a Short Overview
Speaker: LMX Meeting: T. Lippert
Date: Wednesday 3 May 2017 9:30
Room: OHSA/E13

Publishing in Materials Science – Editor, Reviewer & Author Responsibilities - Abstract
Speaker: Special LMX Seminar: Anna Troeger, Wiley, Editor for Advanced Energy Materials, Small, Advanced Materials Interfaces, Solar RRL, and Global Challenges.
Date: Thursday 11 May 2017 14:00
Room: OFLG/402

X-Ray Analysis on Thin Films - Abstract
Speaker: Prof. Alex Dommann
Head of Department Materials meet Life, EMPA

Date: Friday 19 May 2017 15:30
Room: OFLG/402

TBA - show titel
Speaker: LMX Meeting: Oles Sendestsky
Date: Tuesday 13 June 2017 9:30
Room: ODRA/111

31 January 2017

Thomas Lippert new Editor-in-Chief of Applied Physics A

Prof. Dr. Thomas Lippert has been appointed as new "Editor in Chief" of the journal Applied Physics A. He succeeds Michael Stuke who served Applied Physics A more than 20 years as an Editor in Chief.


Most recent Paper

Alejandro Ojeda, Christof W. Schneider, Max Doebeli, Thomas Lippert, and Alexander Wokaun
Plasma plume dynamics, rebound, and recoating of the ablation target in pulsed laser deposition
J. Appl. Phys., 121 135306 (2017)

11 April 2017

Plasma plume dynamics, rebound, and recoating of the ablation target in pulsed laser deposition

The effects of the type of background gas and pressure on the spatial distributions of plume species have been investigated by time and space resolved imaging in vacuum, 1x10-2 mbar and 1x10-1 mbar O2 and Ar. The ablation of La0.4Ca0.6MnO3 in vacuum shows dissimilar arrival times for the different neutral species and a backscattering of the impinging species from the substrate. At 1x10-2 mbar, a species-dependent plume splitting appears and preferential scattering of the lighter elements is detected generating a cation off-stoichiometry along the plume axis. In addition at 1x10-1 mbar the plume expansion in this relatively high pressure traps a portion of the background gas against the substrate holder, thereby creating a transient high local pressure with remarkable effects once the plume reaches the substrate. In an Ar background, a rebound wave is seen, which travels backwards and recoats/contaminates the target with a different composition than the original target. In O2, in addition to the rebound, a long-lived volume of excited species is created, which consists mainly of LaO I. The rebound has important effects on the film composition and is background gas dependent. The same effects are also detected during Ag ablation and are probably valid for most target materials.
Keywords: pulsed laser deposition; laser induced plasma; time-resolved optical spectroscopy; rebound effect;

Facility: Thin Films and Interfaces, LMX, ENE, ETHZ

Reference: A. Ojeda et al., J. Appl. Phys., 121 135306 (2017)

Read full article: here