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Advanced Lithography and Metrology

The group focuses on the operation and further development of extreme ultraviolet (EUV) interference lithography. This technique makes use of synchrotron-generated EUV light at 13.5 nm wavelength and holographic gratings for the fabrication of periodic and high-resolution nanostructures over large areas with high throughput. With a world record in resolution for photolithography down to 7 nm half pitch, the XIL-II beamline at Swiss Light Source is the world-leading tool and is used extensively used for both academic and industrial research as well as for commercial applications. EUV-IL provides a unique test center for photoresist testing for semiconductor manufacturers and helps in the development of next generation computer processors and memory chips. At the same time, this novel technology offers new opportunities for academic research by providing 1D and 2D periodic nanostructures for various projects, thanks to its high resolution, high throughput, and large area capabilities.

In addition, we work on the design and fabricate nanostructures for plasmonics and metamaterials. With the advancement of nanotechnology and better understanding of light-matter interactions at nanoscale in the last decades, plasmonic and photonic nanostructures have emerged as powerful tools to increase the light-matter interaction or realization of materials with novel optical properties. For instance, surface-enhanced Raman scattering (SERS) using metallic nanostructures and fluorescence enhancement using metallic and dielectric nanostructures offers a great potential for biosensing applications. Our motivation is driven by the fact that for realization of practical biosensors for quantitative and real-time applications, the high sensitivity and specificity of these techniques must be accompanied by controlled and reproducible substrates and, preferably, label-free detection schemes. Moreover, far-field and near-field properties of the nanostructures offer new opportunities for realization of novel optical components and devices.

Current Research

EUV Interference Lithography
    • Characteristics of EUV-IL
    • Science Based on EUV-IL structures

See also XIL-II beamline for more information.

Plasmonics and Nanophotonics
    • Metallic Nanowire-Grids
    • High Aspect Ratio Plasmonic Nanostructures
    • Surface-Enhanced Raman Spectroscopy
    • Resonant Dielectric Nanostructures for Biosensing