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Dieser Inhalt ist nicht auf Deutsch verfügbar.Beamline Layout
| Element | Distance from source [ m ] |
|---|---|
| Slit 0 (horizontal direction only) | 12.1 |
| Slit 1 | 26.0 |
| Si(111) Monochromator, 2nd crystal variable horizontal focusing | 28.6 (2nd crystal) |
| Mirror with SiO2, Rh, and Pt coating, variable vertically focusing | 29.4 |
| Slit 2 | 30.7 |
| Slit 3 | ~33.4 |
| Fast shutter | ~33.6 |
| Slit 4 | ~33.7 |
| Sample position | ~34 |
| Detector position | up to ~41 |