Laboratory for Micro and Nanotechnology (LMN)
LMN is dedicated to fundamental and applied research with a focus on:
- Outstanding nanoscience by exploiting the synergies between advanced micro/nanofabrication and PSI’s large scale facilities, in particular the Swiss Light Source (SLS)
- Enabling innovations in instrumentation (optics, detectors, diagnostics etc.) for large scale facilities by applying nanotechnology
- Providing advanced micro- and nanofabrication technologies to academic and industrial users, in particular in the area of polymer nanotechnology.
Latest Scientific Highlights
In a joint research effort, an international team of scientists lead by Emmanuelle Jal (Sorbonne Université) performed a time-resolved experiment at the FERMI free-electron laser to disclose the dynamic behavior of two magnetic element of a compount material in only one snapshot. The X-ray Optics and Applications group developed a dedicated optical element for this experiment that is usable with two different photon energies (colors) simultaneously.
Scientists in the Applied Physics department of Yale University – one of the leading authors, Alexander Grimm, has in the meantime relocated to PSI – have developed a new device that combines the Schrödinger’s cat concept of superposition (a physical system existing in two states at once) with the ability to fix some of the trickiest errors in a quantum computation.
In a joint research effort, an international team of scientists lead by Prof. Giovanni de Ninno (University of Nova Gorica, Elettra Sincrotrone Trieste) now demonstrated that an OAM-dependent dichroic effect can be observed on photoelectrons. The photoelectrons are released from a sample of He atoms that is excited by the strong extreme ultraviolet light pulses from the FERMI free electron laser, whereas the orbtial momentum is imprinted with an intense infrared laser pulse. The X-ray Optics and Applications group of PSI supported the team with their experience in the creation of OAM beams and during the experiments.
Heidelberg DWL66+ direct laser writer, funded by ANAXAM, is in operation now. It is a new photolithographic system closing the gap between the mask aligners on one side and the Nanoscribe two-photon 3D lithography system on the other. It is equipped with semiconductor laser with the wave length of 405 nm and is capable of exposing the minimum feature size down to 0.3 µm on wafers up to 200 mm or 9"x9" mask blanks.