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Laboratory for Micro and Nanotechnology

  • About LMN
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      • X-ray Optics for Imaging and Spectroscopy
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        • Refractive Lenses by 2 Photon 3D Lithography
      • Wavefront Metrology and Manipulation
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      • X-ray Optics for XFELs
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XIL-II facility at the SLS

The X-ray interference lithography facility at the Swiss Light Source (SLS) is a unique tool to obtain periodic nanostructures with periods as small as 25nm.The beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. Because of this the technique is also called Extreme-Ultraviolet Interference Lithography (EUV-IL).

xil setup.jpg

Further information

Research and develoment of EUV-IL based structuring
Beamline Status and Information

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Contact

Dr. Yasin Ekinci

Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Telephone:
+41 56 310 2824
Telefax:
+41 56 310 2646
E-mail:
yasin.ekinci@psi.ch

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Paul Scherrer Institut

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