XIL-II facility at the SLS

The X-ray interference lithography facility at the Swiss Light Source (SLS) is a unique tool to obtain periodic nanostructures with periods as small as 25nm.The beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. Because of this the technique is also called Extreme-Ultraviolet Interference Lithography (EUV-IL).

Research and develoment of EUV-IL based structuring
Beamline Status and Information