Info message Ce contenu n'est pas disponible en français. Ne plus afficher ce message. Research Topics and Technology Development at LMN X-ray Optics and Applications - X-ray Optics for Imaging and Spectroscopy - Wavefront Metrology and Manipulation - X-ray Optics for XFELs Polymer Nanotechnology - Nanoimprint Lithography - Three Dimensional Structures Molecular Nanoscience - Molecular Monolayers - Spins in Molecular Monolayers - SiC: Surfacea and Interfaces Advanced Lithography and Metrology - Extreme Ultraviolet Interference Lithography - EUV Lensless Imaging Quantum Technologies Group - Strained germanium laser - 2D semiconductor and CDW-based memory devices - Rare earth and novel superconducting qubits - Imaging quantum many-body physics - Nonlinear magnonics - Bosonic quantum error correction with superconducting circuits Nanotechnology Group - Operating the ISO4/ISO6 hybrid cleanroom - Technological and technical support of users - Developing micro/nanofabrication processes Sidebar Contact Laboratory for Micro-and Nanotechnology Paul Scherrer Institut 5232 Villigen PSI Switzerland Head a.i.Dr. Yasin Ekinci Secretary Ms. Anne Sacher Tel +41 56 310 2814 Fax +41 56 310 2646 Email: annekathrin.sacher@psi.ch Photon Science Division Homepage of PSI Division Photon Science (PSD)
X-ray Optics and Applications - X-ray Optics for Imaging and Spectroscopy - Wavefront Metrology and Manipulation - X-ray Optics for XFELs
Molecular Nanoscience - Molecular Monolayers - Spins in Molecular Monolayers - SiC: Surfacea and Interfaces
Advanced Lithography and Metrology - Extreme Ultraviolet Interference Lithography - EUV Lensless Imaging
Quantum Technologies Group - Strained germanium laser - 2D semiconductor and CDW-based memory devices - Rare earth and novel superconducting qubits - Imaging quantum many-body physics - Nonlinear magnonics - Bosonic quantum error correction with superconducting circuits
Nanotechnology Group - Operating the ISO4/ISO6 hybrid cleanroom - Technological and technical support of users - Developing micro/nanofabrication processes