Dr. Iacopo Mochi Group Leader "Advanced Lithography and Metrology" +41 56 310 45 73 iacopo.mochi@psi.ch
Dr. Iacopo Mochi Group Leader "Advanced Lithography and Metrology" +41 56 310 45 73 iacopo.mochi@psi.ch
Dr. Iacopo Mochi Group Leader "Advanced Lithography and Metrology" +41 56 310 45 73 iacopo.mochi@psi.ch
Beamline Layout The X-ray Interference Lithography facility is built in the same straight section with the SIS beamline. It has its own undulator and optics sharing the same optical hutch with the SIS beamline. Figure 1: Layout of the XIL-II.