XIL-II (X09LB): Extreme Ultraviolet Interference Lithography

XIL header.png

The X-ray Interference Lithography (XIL) beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. The light from the undulator source is filtered by a pinhole spatial filter to deliver spatially coherent illumination in the custom designed exposure chamber.

Energy range

70 - 500 eV

Flux (92 eV)

3 x 1015 ph / s / cm2 / 4%BW / 0.3A

Spot size

5 mm x 5 mm

 

2. July 2015: 
XIL-II demonstrates seven nanometer resolution: PSI News on our publication:
Single-digit-resolution nanopatterning with extreme ultraviolet light for the 2.5 nm technology node and beyond, 
N. Mojarad, M. Hojeij, L. Wang, J. Gobrecht, and Y. Ekinci 
Nanoscale 7, 4031 (2015) 
DOI: 10.1039/C4NR07420C

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