PSI Cleanroom Laboratories

LNQ is  operating the new PICO cleanroom, located in Park Innovaare on the West side of PSI and the two old cleanroom labs, in the building ODRA located on the East side of PSI

The PICO cleanroom in Park Innovaare is a  new 450 m2 cleanroom (classes 4 and 5), professionally designed and equipped state-of-the-art cleanroom lab.  Another 150m2 of space is available for the industrial customers and companies interested to have their private cleanroom with access to the PSI shared tools in PICO. 
The old ODRA nanotechnology cleanroom is a 170 m2 net clean area (hybrid class 10/class 1000), professionally designed and equipped state-of-the-art cleanroom lab.
The „processing lab" is a semi-cleanroom of ca. 150 m2 with laminar flow boxes in the critical areas and a class 10’000 environment elsewhere. 

SUSS MA8-BA6
:: 200mm Mask Aligner
  :: Photolithography

Contact: Dario Marty

 

SUSS MA6-BA6
:: 150mm Mask Aligner
  :: Photolithography

Contact: Dario Marty

Phable R200
:: Displacement Talbot Lithography
  :: Photolithography

Contact: Konstantins Jefimovs

Heidelberg DWL66+
:: 200mm Direct Laser Writer
  :: Maskless Lithography

Contact: Konrad Vogelsang

 

Raith/Vistec EBPG 5000Plus
:: Electron Beam Direct Writer
  :: Maskless Lithography

Contact: Kevin Hofhuis

 

Nanoscribe GT+
:: Two-photon Direct Writer
  :: Maskless Lithography

Contact: Anja Weber

Wet Chemistry Area
:: Etching with acids and alkali
  :: Sample Processing

Contact: Dario Marty

Photolithography Area
:: Exposures Development 
  :: Sample Processing

Contact: Dario Marty

Oxford DRIE
:: PlasmaLab 100 ICP Deep Reactive Ion Etcher
   :: Plasma Etching
      :: 100mm

Contact: Christopher Wild

Sentech ICP RIE
:: SI500 ICP Reactive Ion Etcher
   :: Plasma Etching
       :: 200mm

Contact: Christopher Wild

SPTS DRIE
:: Rapier Omega LPX Deep Reactive Ion Etcher
   :: Plasma Technology
      :: 200mm

Contact: Konstantins Jefimovs

Oxford IonFab 300Plus
:: Ar Ion Milling / Ion Beam Deposition (IBD) Tool
   :: Plasma Technology
       :: 100mm

Contact: Anja Weber

Oxford ICP RIE
:: PlasmaLab 100 Inductively Coupled Plasma Reactive Ion Etcher (ICP-RIE)
   :: Plasma Technology
       :: 100mm

Contact: Christopher Wild

Evatec BAKUNI
:: Physical Vapor Deposition
   :: Thin Film Technology
       :: 200mm

Contact: Dario Marty

Oxford PECVD
::  PlasmaLab 80+ Plasma Enchanced Chemical Vapor Deposition
   :: Thin Film Technology
       :: 100mm

Contact: Christopher Wild

Picosun PE-ALD
:: R200 Plasma Enhanced Atomic Layer Deposition (PE-ALD)
   :: Thin Film Technology
       :: 200mm

Contact: Vitaliy Guzenko

STEED 
  :: Oxidation Furnace
    :: Thin Film Technology

Contact: Dario Marty

Leibold UNIVEX
  :: Physical Vapor Deposition (e-gun evaporator)
    :: Thin Film Technology

Contact: Dario Marty

Zeiss Supra 55VP
:: Scanning Electron Microscope (Variable Pressure mode)
  :: Sample Inspection

Contact: Anja Weber

Hitachi Regulus 8230
:: Scanning Electron Microscope with EDX
  :: Sample Inspection

Contact: Anja Weber

Leica INM20 & INM100
:: Reflected-Light Microscope 
  :: Sample Inspection

Contact: Jana Lehmann

Veeco DEKTAK 8
:: Stylus Profilometer
  :: Sample Inspection

Contact: Dario Marty

KEYENCE VK-X3100
:: 3D Optical Profiler
  :: Sample Inspection

Contact: Konrad Vogelsang

All the tools available in PICO can be reserved using Openiris
You can find all the tools by searching for "cleanroom" in the "Enter filter texts" top left window, or for the tool name listed on this webpage.