Lab News & Scientific Highlights

The MNE conference is the flagship event of the International Society for Micro- and Nanotechnology (iMNEs). The research fields covered by the MNE conferences have consistently driven advancements in the development of smaller and smaller structures. To emphasize the significance of micrographs in this field, the conference features a micrograph contest, sponsored and hosted by Zyvex Labs. Entries are judged based on both their technological relevance and artistic merit. 

This year, Peng Qi from the X-ray Nano Optics group, LXN, CPS, earned third place and an honorable mention for his two submitted images.

Photoresist materials are crucial in the manufacturing of computer chips, where the circuits are initially printed in the photoresist using photolithography.  As the demand for smaller and more precise circuitry in computer chips grows, photoresists must resolve features with smaller sizes and higher density. One of the factors determining the ultimate resolution in lithography is the molecular size/mass of the photoresists.