Dr. Yasin Ekinci, Head of the Advanced Lithography and Metrology Group and ad interim Head of the Laboratory for Micro and Nanotechnology, has been elected to the grade of Fellow of The International Society for Optics and Photonics (SPIE). SPIE is the international society for optics and photonics, an educational not-for-profit organisation founded in 1955 to advance light-based science, engineering, and technology
SPIE Fellows are members of distinction who are honoured for their technical achievements in the multidisciplinary fields of optics, photonics, and imaging, and for their service to the optics community and to SPIE. Since the Society's inception in 1955, 1’478 SPIE Members have become Fellows.
Dr. Ekinci has received the recognition for his outstanding contributions to EUV lithography and metrology. He stated that this honour is, in fact, due to Paul Scherrer Institute’s (PSI) recognition of the contributions to the EUV lithography, a technology developed for the manufacturing of semiconductor devices, which has entered the production phase. Dr. Ekinci stated that EUV lithography will be used for future computer chip production. Therefore, by the end of 2019, serial production of smartphones will already be inserting semiconductor devices that have been manufactured by means of EUV lithography - a minute but significant part of technology developed by PSI.