robert kirchner.jpg

Dr. Robert Kirchner

PostDoc 3D-Lithography and Nanotechnology

Paul Scherrer Institut
Laboratory for Micro- and Nanotechnology
5232 Villigen PSI

Telephone: +41 56 310 2430

Current research

  • 3D-Lithography (electron beam, 2-photon-absorption, EUV)
  • Material simulation
  • Biomimetic applications
  • Soft-lithography

Research expertise

  • Nanoimprint lithography
  • Surface modification & characterization
  • Polymerization & polymer modification
  • Process & technology development
  • Planar photonics / micro cavities
  • Biosensors
  • Materials cytotoxicity


Robert Kirchner (*1981, Germany) studied Electrical Engineering at the Technische Universität Dresden (Germany) and Chalmers University of Technology (Sweden) from 2001 until 2007 with a special focus on Electronics Packaging, Biomedical Engineering and Microsystems Technology. In his PhD he developed an UV-assisted nanoimprint lithography (UV-NIL) process for planar photonic biosensors until 2011. Until 2012 he holds a PostDoc position at the TU Dresden to transfer this UV-NIL process as pre-production technology to the Fraunhofer Institute of Photonic Microsystems (IPMS) in Dresden. Since 2013 he holds a PostDoc position at the Paul Scherrer Institut within the Laboratory for Micro- and Nanotechnology. His main focus is on new 3D lithography approaches using electron beam grayscale and two-photon patterning. His current interest lies in exploitation of the interaction of polymers with electrons and high energy photons for micro-nano-fabrication. He realized numerous industrial projects for optical und bio-inspired applications.

Recent publications in 2017

R Fallica, R Kirchner, H Schift, Y Ekinci
High-Resolution Grayscale Patterning using Extreme Ultraviolet Interference Lithography
Microelectron Eng 177, 2017, 1-5

R Kirchner, N Chidambaram, M Altana, H Schift
Reducing the roughness of 3D micro-optics
SPIE Newsroom, 2017, (3 pp)

Key publications

R Fallica, R Kirchner, Y Ekinci, D Mailly
Comparative study of resists and lithographic tools using the Lumped Parameter Model
J Vac Sci Technol B 34, 2016, 06K702 (8 pp)

N Chidambaram, R Kirchner, M Altana, H Schift
High fidelity 3D thermal nanoimprint with UV curable polydimethyl siloxane stamps
J Vac Sci Technol B 34, 2016, 06K401 (6 pp)

M Pianigiani, R Kirchner, E Sovernigo, A Pozzato, M Tormen, H Schift
Effect of nanoimprint on the elastic modulus of PMMA: comparison between standard and ultrafast thermal NIL
Microelectron Eng 155, 2016, 85-91

S Pfirrmann, R Kirchner, O Lohse, VA Guzenko, A Voigt, L Harder, A Kolander, H Schift, G Grützner
mr-PosEBR – A novel positive tone resist for high resolution electron beam lithography and 3D surface patterning
Proc. SPIE, 9779, 2016, 977925 (13pp)

R Kirchner, VA Guzenko, I Vartiainen, N Chidambaram, H Schift
ZEP520A - A resist for electron-beam grayscale lithography and thermal reflow
Microelectron Eng 153, 2016, 71-76

R Kirchner, VA Guzenko, M Rohn, E Sonntag, M Mühlberger, I Bergmair, H Schift
Bio-inspired 3D funnel structures made by grayscale electron-beam patterning and selective topography equilibration
Microelectron Eng 141, 2015, 107-111

R Kirchner, H Schift
Mobility based 3D simulation of selective, viscoelastic polymer reflow using SURFACE EVOLVER
J. Vac. Sci. Technol. B 32, 2014, 06F701 (7pp) Supplemental material on JVSTB

R Kirchner, A Schleunitz, H Schift
Energy-based thermal reflow simulation for 3D polymer shape prediction using Surface Evolver
J Micromech Microeng 24, 2014, 055010 (7pp)

R Kirchner, A Finn, R Landgraf, L Nueske, L Teng, M Vogler, W-J Fischer,
Direct UV-Imprinting of Hybrid-Polymer Photonic Microring Resonators and their Characterization
J Lightwave Technol 32 (9), 2014, 1674-1681

A Finn, R Hensel, F Hagemann, R Kirchner, A Jahn, WJ Fischer
Geometrical properties of multilayer nano-imprint-lithography molds for optical applications
Microelectron Eng 98, 2012, 284-287

R Kirchner, J Derix, A Nocke, R Landgraf
Direct Nanoimprinting for Micro-and Nanosystems
Bio and Nano Packaging Techniques for Electron Devices, 2012, 209-242

R Kirchner, MK Kaiser, B Adolphi, R Landgraf, WJ Fischer
Chemical functional polymers for direct UV assisted nanoimprinting of polymeric photonic microring resonators
physica status solidi (a) 208 (6), 2011, 1308-1314

R Kirchner, L Teng, B Lu, B Adolphi, WJ Fischer
Degradation of Perfluorotrichlorosilane Antisticking Layers: The Impact on Mold Cleaning, Ultraviolet-Nanoimprinting, and Bonded Ultraviolet-Nanoimprint Molds
Jap J Appl Phys 50 (6), 2011


R Kirchner, M Plötner, WJ Fischer
Imprinttemplate, Nanoimprintvorrichtung und Nanostrukturierungsverfahren
DE Patent: 102,010,043,059

R Kirchner, M Ploetner, W Fischer
US Patent: US 8303291 B2

Profiles online (including further publications)

Last edited on: 27 Jan 2017 - 13:17