5232 Villigen PSI
Zhitian Shi is a PhD student in the X-ray Tomography Group at Paul Scherrer Institut and ETH Zürich since October, 2018. Before that, he received his degrees in Materials Science and Engineering from Northeastern University (China) in 2011 (Bsc.) and General Research Institute for Nonferrous Metals in 2015 (Msc.). From April 2015 to September 2018, he worked as a dry etching process engineer at Samsung (China) Semiconductor.
Currently, Zhitian’s research focuses on the fabrication and characterization of high aspect ratio (HAR) gratings for X-ray grating interferometry (XGI) systems, including process development of lithography, etching and deposition; and grating test on XGI setups.