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The mission of Nanotechnology and Infrastructure Group is to operate the cleanrooms at the Laboatory for Micro- and Nanotechnology, to provide scientific and technological support to the cleanroom users and to develop novel micro- and nanofabrication techniques for success of current and future research projects. Moreover, the group can also provide nanofabication services to external academic and industrial customers.

12 October 2020
Heidelberg DWL66+ at LMN

Installation of Heidelberg DWL66+

Heidelberg DWL66+ direct laser writer, funded by ANAXAM, is in operation now. It is a new photolithographic system closing the gap between the mask aligners on one side and the Nanoscribe two-photon 3D lithography system on the other. It is equipped with semiconductor laser with the wave length of 405 nm and is capable of exposing the minimum feature size down to 0.3 µm on wafers up to 200 mm or 9"x9" mask blanks.

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11 September 2020
SPTS Rapier DRIE

Installation of SPTS Rapier Deep Reactive Ion Etcher

SPTS Rapier system for Si deep reactive ion etching (DRIE) is released for user operation. The system is acquired by PSI as a part of SNF R’Equip project “Advanced Si DRIE tool for highly uniform ultra-deep structuring (SiDRY)”. This versatile tool is equipped with pulsed bias option and sensitive ClaritasTM optical end point detection system. Electrostatic clamping and wafer edge protection systems are both available for three wafer diameters – 100 mm, 150 mm, and 200 mm.

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Contact

Dr. Vitaliy Guzenko

Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Telephone:
+41 56 310 5436
E-mail:
vitaliy.guzenko@psi.ch