Direkt zum Inhalt
  • Paul Scherrer Institut PSI
  • PSI Research, Labs & User Services

Digital User Office

  • Digital User Office
  • DE
  • EN
  • FR
Paul Scherrer Institut (PSI)
Suche
Paul Scherrer Institut (PSI)

Hauptnavigation

  • Research at PSIÖffnen dieses Hauptmenu Punktes
    • Research Initiatives
    • Research Integrity
    • Scientific Highlights
    • Scientific Events
    • Scientific Career
    • PSI-FELLOW
    • PSI Data Policy
  • Research Divisions and LabsÖffnen dieses Hauptmenu Punktes
    • Overview
    • Research with Neutrons and Muons
    • Photon Science
    • Energy and Environment
    • Nuclear Energy and Safety
    • Biology and Chemistry
    • Large Research Facilities
  • Facilities and InstrumentsÖffnen dieses Hauptmenu Punktes
    • Overview
    • Large Research Facilities
    • Facilities
    • PSI Facility Newsletter
  • PSI User ServicesÖffnen dieses Hauptmenu Punktes
    • User Office
    • Methods at the PSI User Facilities
    • Proposals for beam time
    • Proposal Deadlines
    • Data Analysis Service (PSD)
    • EU support programmes
  • DE
  • EN
  • FR

Digital User Office (mobile)

  • Digital User Office

Sie befinden sich hier:

  1. PSI Home
  2. Labs & User Services
  3. PSD
  4. LMN
  5. Research Groups
  6. Polymer Nanotechnology
  7. Nanoimprint Lithography

Sekundäre Navigation

Laboratory for Micro and Nanotechnology

  • About LMN
    • Organisational Structure
  • Open Positions
  • People
  • Research Groups Ausgeklappter Submenü Punkt
    • Nanotechnology
    • X-ray Optics and Applications
      • X-ray Optics for Imaging and Spectroscopy
        • Fresnel Zone Plate for X-ray Microscopy
        • Blazed X-ray Optics
        • Zernike X-ray Phase Contrast Microscopy
        • Fresnel Zone Plates for RIXS
        • Refractive Lenses by 2 Photon 3D Lithography
      • Wavefront Metrology and Manipulation
        • Vortex Fresnel Zone Plates
        • Grating-based Wavefront Metrology
      • X-ray Optics for XFELs
        • Diamond Fresnel Zone Plates
        • Beam Splitter Gratings for Spectral Monitoring
        • A Delay Line for Ultrafast Pump-Probe Experiments
        • X-ray Streaking for Ultrafast Processes
    • Polymer Nanotechnology Ausgeklappter Submenü Punkt
      • Nanoimprint Lithography
      • Three Dimensional Structures
    • Molecular Nanoscience
      • On-surface Chemistry
      • Spins in Molecular Monolayers
      • SiC: Surfaces and Interfaces
      • Our Research Team
    • Advanced Lithography and Metrology
      • EUV Interference Lithography
      • EUV Lensless Imaging
      • ALM Nanoscience
    • Quantum Technologies
      • News and highlights
      • People
      • Open positions
      • Current projects
        • 2D semiconductor devices
        • CDW-based memory devices
        • Imaging quantum many-body states
        • Nonlinear magnonics
        • Rare-earth quantum magnets
        • Strained Germanium laser
      • Techniques
        • Cristallina-Q
        • IR beamline
        • Nano-fabrication
      • Publications
      • QTC@PSI
  • Facilities and Equipment
    • Cleanroom Labs
    • Surface Science Lab
    • Scanning Electron Microscopy
    • Scanning Probe Microscopy
    • PEARL Beamline
    • XIL Facility at the SLS
    • Nanoimprint Facilities
    • Electron Beam Lithography
  • LMN News
  • LMN Highlights
    • Archive
  • Publications
    • Publications 2011 - 2016

Info message

Dieser Inhalt ist nicht auf Deutsch verfügbar.

Nanoimprint Lithography

Nanoimprint Lithography (NIL) is a novel technique for the fabrication of nanostructures on large surfaces. The method is based on the excellent replication fidelity obtained with polymers. Once a solid stamp with a nanorelief on the surface is fabricated it can be used for the replication of many identical surface patterns. It therefore circumvents many limitations of conventional photolithography. In PSI we use both thermal NIL into various thermoplastic materials and UV-assisted NIL, e.g. for the fabrication of stamp copies.

NIL Process Chain
NIL Process Chain
The process chain mainly consists of the three steps:
  1. Align substrate, resist and stamp
  2. Imprint into polymer film
  3. Pattern transfer into substrate


The pattern transfer is often necessary if the imprinted polymer is not directly used as a functional material, but for patterning a large area substrate such as a silicon wafer or magnetic disc. It is therefore able to replace common high resolution lithography which is either costly or not able to pattern complex structures with 3D surface topographies.

Publications

Nanoimprint lithography: An old story in modern times? A review
J. Vac. Sci. Technol. B 26(2), 458-480 (2008)
Helmut Schift

NaPa Library of Processes
editor H.Schift, published by the NaPa-consortium
first edition (2008) ISBN 978-3-00-024396-7, second edition (2012)
Free download: NaPa Library of Processes

Nanoimprint lithography - patterning resists using molding
H. Schift and A. Kristensen
Handbook of Nanotechnology, Chapter (Part A/9), third edition, revised and extended, 2010
Springer Verlag Berlin Heidelberg, Germany. ISBN: 978-3-642-02524-2

Mit Sidebar

Contact

Dr. Helmut Schift

Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Telephone:
+41 56 310 2839
Telefax:
+41 56 310 2646
E-mail:
helmut.schift@psi.ch

top

Fussbereich

Paul Scherrer Institut

Forschungsstrasse 111
5232 Villigen PSI
Schweiz

Telefon: +41 56 310 21 11
Telefax: +41 56 310 21 99

Der Weg zu uns
Kontaktformular

Besucherzentrum psi forum
Schülerlabor iLab
Zentrum für Protonentherapie
PSI Bildungszentrum
PSI Guest House (in english)
PSI Gastronomie

Service & Support

  • Telefonbuch/​Personensuche
  • User Office
  • Accelerator Status
  • Publikationen des PSI
  • Lieferanten
  • E-Rechnung
  • Computing
  • Sicherheit

Karriere

  • Arbeiten am PSI
  • Stellenangebote
  • Aus- und Weiterbildung
  • Berufsbildung
  • PSI Bildungszentrum

Für die Medien

  • Das PSI in Kürze
  • Zahlen und Fakten
  • Medienkontakt
  • Medienmitteilungen
  • Social Media Newsroom

Folgen Sie uns: Twitter (deutsch) LinkedIn Youtube Issuu RSS

Footer legal

  • Impressum
  • Nutzungsbedingungen
  • Editoren-Login