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Laboratory for Micro and Nanotechnology

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    • X-ray Optics and Applications
      • X-ray Optics for Imaging and Spectroscopy
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        • Fresnel Zone Plates for RIXS
        • Refractive Lenses by 2 Photon 3D Lithography
      • Wavefront Metrology and Manipulation
        • Vortex Fresnel Zone Plates
        • Grating-based Wavefront Metrology
      • X-ray Optics for XFELs
        • Diamond Fresnel Zone Plates
        • Beam Splitter Gratings for Spectral Monitoring
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LMN News

4. Februar 2021
Robert Kaelin

New group member

Robert Kälin officially joins the Quantum Technologies  group as technician of the Cristallina endstation.

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19. Januar 2021
Alex Steppke UZH

New group member

Alexander Steppke officially joins the Quantum Technologies group as project coordinator for the collaboration of the Cristallina-Q team and the Laboratory of Quantum Matter (LQM) of Prof. Johan Chang at the University of Zurich (UZH).

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11. Januar 2021
Iuliia Bykova

New group member

Iuliia Bykova officially joins the group X-ray Optics and Applications as Post-Doc. We wish her every success. 

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12. Oktober 2020
Heidelberg DWL66+ at LMN

Installation of Heidelberg DWL66+

Heidelberg DWL66+ direct laser writer, funded by ANAXAM, is in operation now. It is a new photolithographic system closing the gap between the mask aligners on one side and the Nanoscribe two-photon 3D lithography system on the other. It is equipped with semiconductor laser with the wave length of 405 nm and is capable of exposing the minimum feature size down to 0.3 µm on wafers up to 200 mm or 9"x9" mask blanks.

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11. September 2020
SPTS Rapier DRIE

Installation of SPTS Rapier Deep Reactive Ion Etcher

SPTS Rapier system for Si deep reactive ion etching (DRIE) is released for user operation. The system is acquired by PSI as a part of SNF R’Equip project “Advanced Si DRIE tool for highly uniform ultra-deep structuring (SiDRY)”. This versatile tool is equipped with pulsed bias option and sensitive ClaritasTM optical end point detection system. Electrostatic clamping and wafer edge protection systems are both available for three wafer diameters – 100 mm, 150 mm, and 200 mm.

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Laboratory for Micro-
and Nanotechnology
Paul Scherrer Institut
5232 Villigen PSI
Switzerland

Head a.i.
Dr. Yasin Ekinci

Secretary
Ms. Anne Sacher

Tel +41 56 310 2814
Fax +41 56 310 2646
Email: annekathrin.sacher@psi.ch

Photon Science Division

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