XIL header.png

XIL-II (X09LB): Extreme Ultraviolet Interference Lithography

The X-ray Interference Lithography (XIL) beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. The light from the undulator source is filtered by a pinhole spatial filter to deliver spatially coherent illumination in the custom designed exposure chamber.

Visit the XIL-II site for more information.
Energy range 70 - 500 eV
Flux (92 eV) 3 x 1015 ph / s / cm2 / 4%BW / 0.3A
Spot size 5 mm x 5 mm

User Contact Points at PSI

PSI User Office
DUO Login

Call for Proposals

PX Beamlines ("X06SA", "X06DA", "X10SA") The submission deadline has been reached and the proposals are under evaluation.

More Information

All other Beamlines
08 August 2014: Call is open for proposals
More Information

Upcoming Events

Get a list of upcoming scientific conferences and seminars

PSI User Facilities Newsletter

Current News from PSI photon, neutron and muon user facilities