XIL-II (X09LB): Extreme Ultraviolet Interference Lithography
The X-ray Interference Lithography (XIL) beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. The light from the undulator source is filtered by a pinhole spatial filter to deliver spatially coherent illumination in the custom designed exposure chamber.
Visit the XIL-II
site for more information.
| Energy range
|| 70 - 500 eV
| Flux (92 eV)
|| 3 x 1015 ph / s / cm2 / 4%BW / 0.3A
| Spot size
|| 5 mm x 5 mm
Call for Proposals
PX Beamlines ("X06SA", "X06DA", "X10SA")
The submission deadline has been reached and the proposals are under evaluation.
All other beamlines: Call is closed
| Next call on February 8, 2014
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