XIL-II (X09LB): Extreme Ultraviolet Interference Lithography
The X-ray Interference Lithography (XIL) beamline provides spatially coherent beam in the Extreme Ultraviolet (EUV) energy range. The light from the undulator source is filtered by a pinhole spatial filter to deliver spatially coherent illumination in the custom designed exposure chamber.Visit the XIL-II site for more information.
| Energy range | 70 - 500 eV |
|---|---|
| Flux (92 eV) | 3 x 1015 ph / s / cm2 / 4%BW / 0.3A |
| Spot size | 5 mm x 5 mm |