The PEEM is equipped with a small preparation chamber (sputtering, heating, load-lock). In addition, a more complete preparation system is available with a load-lock, LEED and Auger, several evaporation sources, rotatable electromagnetic coil, ion etching and electron bombardment heating.
Users can apply for beamtime with the PEEM or with their own endstation (after prior consulation with the beamline scientist).
The SIM beamline is operated by the Microscopy and Magnetism Group.
|Energy range||90-2000 eV|
|Flux (10 keV)||1 x 10^15 photons / s / 0.1%BW / 0.4 A|
|Focused spot size||30 µm x 100 µm (V x H)|
|Spectral resolution||> 5000|
|Polarization|| Linear: 0 deg (horizontal) to 90 deg (vertical)
Circular: right / left
|Endstation ES1|| Photoemission electron microscope with spatial resolution = 100 nm,
variable sample temperature: 120 - 1'800 K.
|Endstation ES3|| XMCD chamber for total electron yield (TEY) measurements in applied field
(130 mT) and variable sample temperature (15 - 300 K).
|Endstation ES4||Presently RESOXS, NNPEH. (These endstations belong to a user group and can only be used in collaboration with them)|